CC

Chen Cheng Chou

TSMC: 19 patents #1,728 of 12,232Top 15%
CO Coretronic: 2 patents #295 of 684Top 45%
📍 Jinshanmian, TW: #102 of 466 inventorsTop 25%
Overall (All Time): #202,812 of 4,157,543Top 5%
21
Patents All Time

Issued Patents All Time

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
12387637 Projection device and driving method of projection device You-Xuan Kuo, Jeng-An Liao 2025-08-12
12119267 Method for manufacturing semiconductor structure Shiu-Ko JangJian, Cheng-Ta Wu 2024-10-15
11551979 Method for manufacturing semiconductor structure Shiu-Ko JangJian, Cheng-Ta Wu 2023-01-10
11106120 Projection device and light source system and projection method thereof Jeng-An Liao, Fu-Shun Kao, Hung-Lin Chen, Hsin-Chang Huang 2021-08-31
10818558 Semiconductor structure having trench and manufacturing method thereof Shiu-Ko JangJian, Cheng-Ta Wu 2020-10-27
9570557 Tilt implantation for STI formation in FinFET structures Chung-Ren Sun, Chii-Ming Wu, Cheng-Ta Wu, Tzu kai Lin 2017-02-14
8779572 On-chip heat spreader Chuan-Yi Lin, Ching-Chen Hao, Sheng Lin 2014-07-15
8742583 Seal ring in an integrated circuit die Chuan-Yi Lin, Ching-Chen Hao, Sheng Lin 2014-06-03
8609506 On-chip heat spreader Chuan-Yi Lin, Ching-Chen Hao, Sheng Lin 2013-12-17
8314483 On-chip heat spreader Chuan-Yi Lin, Ching-Chen Hao, Sheng Lin 2012-11-20
8207567 Metal-oxide-metal structure with improved capacitive coupling area Chao-Chi Chin, Ming-Chu King 2012-06-26
8168529 Forming seal ring in an integrated circuit die Chuan-Yi Lin, Ching-Chen Hao, Sheng Lin 2012-05-01
6787470 Sacrificial feature for corrosion prevention during CMP Chu-Wei Hu, Tsu Shih 2004-09-07
6348389 Method of forming and etching a resist protect oxide layer including end-point etch Tzong-Sheng Chang 2002-02-19
6346449 Non-distort spacer profile during subsequent processing Tzong-Sheng Chang, Shih-Chang Huang, Bor-Zen Tien 2002-02-12
6284611 Method for salicide process using a titanium nitride barrier layer Bor-Zen Tien, Tzong-Sheng Chang, Wen-Jye Yue 2001-09-04
6004841 Fabrication process for MOSFET devices and a reproducible capacitor structure Tzong-Sheng Chang 1999-12-21
5817562 Method for making improved polysilicon FET gate electrode structures and sidewall spacers for more reliable self-aligned contacts (SAC) Tzong-Sheng Chang, Jenn Tsao 1998-10-06
5792681 Fabrication process for MOSFET devices and a reproducible capacitor structure Tzong-Sheng Chang 1998-08-11
5766992 Process for integrating a MOSFET device, using silicon nitride spacers and a self-aligned contact structure, with a capacitor structure Jenn Tsao 1998-06-16
5731236 Process to integrate a self-aligned contact structure, with a capacitor structure Jenn Tsao 1998-03-24