SF

Shinsuke Fujiwara

Sumitomo Electric Industries: 56 patents #125 of 21,551Top 1%
NE Nec Home Electronics: 4 patents #8 of 106Top 8%
KC Koha Co.: 3 patents #16 of 58Top 30%
NE Nec: 1 patents #7,889 of 14,502Top 55%
📍 Itami, JP: #19 of 1,436 inventorsTop 2%
Overall (All Time): #38,003 of 4,157,543Top 1%
61
Patents All Time

Issued Patents All Time

Showing 1–25 of 61 patents

Patent #TitleCo-InventorsDate
11242618 Silicon carbide substrate and method of manufacturing the same Shin Harada, Taro Nishiguchi 2022-02-08
9631296 Method of manufacturing silicon carbide substrate Taro Nishiguchi, Tsutomu Hori, Naoki Ooi, Shunsaku UETA 2017-04-25
9583571 Dislocation in SiC semiconductor substrate Taro Nishiguchi, Shin Harada 2017-02-28
9450054 Dislocation in SiC semiconductor substrate Taro Nishiguchi, Shin Harada 2016-09-20
9368568 Group III nitride crystal substrates and group III nitride crystal Koji Uematsu, Hideki Osada, Seiji Nakahata 2016-06-14
9279194 Method of growing III-nitride crystal Hiroaki Yoshida, Koji Uematsu, Masanori Morishita 2016-03-08
9255344 Silicon carbide substrate and method of manufacturing the same Shin Harada, Taro Nishiguchi 2016-02-09
9153742 GaN-crystal free-standing substrate and method for producing the same Koji Uematsu, Hitoshi Kasai, Takuji Okahisa 2015-10-06
9005362 Method for growing group III nitride crystal Yuki Hiromura, Koji Uematsu, Hiroaki Yoshida 2015-04-14
8963166 III nitride crystal substrate and light-emitting device Hiroaki Yoshida 2015-02-24
8962365 Method of manufacturing GaN-based film and composite substrate used therefor Issei Satoh, Yuki Seki, Koji Uematsu, Yoshiyuki Yamamoto, Hideki Matsubara +1 more 2015-02-24
8937339 Si(1-V-W-X)CWAlXNV substrate, and epitaxial wafer Issei Satoh, Michimasa Miyanaga, Hideaki Nakahata 2015-01-20
8912550 Dislocations in SiC semiconductor substrate Taro Nishiguchi, Shin Harada 2014-12-16
8847363 Method for producing group III nitride crystal Koji Uematsu, Hideki Osada, Seiji Nakahata 2014-09-30
8823142 GaN single crystal substrate having a large area and a main surface whose plane orientation is other than (0001) and (000-1) Koji Uematsu, Hideki Osada, Seiji Nakahata 2014-09-02
8715414 Process for producing Si(1-v-w-x)CwAlxNv base material, process for producing epitaxial wafer, Si(1-v-w-x)CwAlxNv base material, and epitaxial wafer Issei Satoh, Michimasa Miyanaga, Hideaki Nakahata 2014-05-06
8697564 Method of manufacturing GaN-based film Koji Uematsu, Yoshiyuki Yamamoto, Issei Satoh 2014-04-15
8697550 Method of manufacturing GaN-based film Issei Satoh, Yuki Seki, Koji Uematsu, Yoshiyuki Yamamoto, Hideki Matsubara +1 more 2014-04-15
8679955 Method for forming epitaxial wafer and method for fabricating semiconductor device Shin Hashimoto, Katsushi Akita, Kensaku Motoki, Hideaki Nakahata 2014-03-25
8642154 Silicon carbide crystal ingot, silicon carbide crystal wafer, and method for fabricating silicon carbide crystal ingot Tsutomu Hori, Makoto Sasaki, Taro Nishiguchi 2014-02-04
8642153 Single crystal silicon carbide substrate and method of manufacturing the same Tsutomu Hori, Makoto Sasaki, Taro Nishiguchi 2014-02-04
8629457 Light-emitting device Taro Nishiguchi, Makoto Sasaki, Shin Harada, Kyoko Okita, Hiroki Inoue +1 more 2014-01-14
8598685 GaN single crystal substrate and method of manufacturing thereof and GaN-based semiconductor device and method of manufacturing thereof Koji Uematsu, Hideki Osada, Seiji Nakahata 2013-12-03
8592289 Epitaxial wafer, method for manufacturing gallium nitride semiconductor device, gallium nitride semiconductor device and gallium oxide wafer Shin Hashimoto, Katsushi Akita, Hideaki Nakahata, Kensaku Motoki 2013-11-26
8586998 Silicon carbide substrate manufacturing method and silicon carbide substrate Hiroki Inoue, Keiji Ishibashi 2013-11-19