Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6121655 | Nonvolatile semiconductor memory device and method for fabricating the same and semiconductor integrated circuit | Kaori Akamatsu, Junichi Kato, Atsushi Hori, Seiki Ogura | 2000-09-19 |
| 6051860 | Nonvolatile semiconductor memory device and method for fabricating the same and semiconductor integrated circuit | Kaori Akamatsu, Junichi Kato, Atsushi Hori, Seiki Ogura | 2000-04-18 |
| 6031268 | Complementary semiconductor device and method for producing the same | Akira Hiroki | 2000-02-29 |
| 6031272 | MOS type semiconductor device having an impurity diffusion layer with a nonuniform impurity concentration profile in a channel region | Akira Hiroki | 2000-02-29 |
| 5830788 | Method for forming complementary MOS device having asymmetric region in channel region | Akira Hiroki | 1998-11-03 |
| 5808347 | MIS transistor with gate sidewall insulating layer | Kazumi Kurimoto, Akira Hiroki | 1998-09-15 |
| 5675168 | Unsymmetrical MOS device having a gate insulator area offset from the source and drain areas, and ESD protection circuit including such a MOS device | Kyoji Yamashita, Kazumi Kurimoto, Akira Hiroki, Isao Miyanaga, Atsushi Hori | 1997-10-07 |
| 5633211 | Semiconductor device and process | Shinichi Imai, Yuka Terai, Masanori Fukumoto, Kousaku Yano, Hiroyuki Umimoto +1 more | 1997-05-27 |
| 5610430 | Semiconductor device having reduced gate overlapping capacitance | Kyoji Yamashita, Kazumi Kurimoto, Hiroyuki Umimoto | 1997-03-11 |
| 5584964 | Method of producing semiconductor device with viscous flow of silicon oxide | Hiroyuki Umimoto, Shin Hashimoto | 1996-12-17 |
| 5518944 | MOS transistor and its fabricating method | Akira Hiroki, Kazumi Kurimoto | 1996-05-21 |
| 5514893 | Semiconductor device for protecting an internal circuit from electrostatic damage | Isao Miyanaga, Kazumi Kurimoto, Atsushi Hori | 1996-05-07 |
| 5512771 | MOS type semiconductor device having a low concentration impurity diffusion region | Akira Hiroki, Kazumi Kurimoto | 1996-04-30 |
| 5455205 | Method of producing semiconductor device | Hiroyuki Umimoto, Shin Hashimoto | 1995-10-03 |
| 5386133 | LDD FET with polysilicon sidewalls | Akira Hiroki, Kazumi Kurimoto | 1995-01-31 |
| 5296719 | Quantum device and fabrication method thereof | Yoshihiko Hirai, Juro Yasui, Yasuaki Terui, Kiyoshi Morimoto, Atsuo Wada +4 more | 1994-03-22 |
| 5292671 | Method of manufacture for semiconductor device by forming deep and shallow regions | — | 1994-03-08 |
| 5221632 | Method of proudcing a MIS transistor | Kazumi Kurimoto, Akira Hiroki | 1993-06-22 |
| 5160996 | Structure and method of manufacture for semiconductor device | — | 1992-11-03 |
| 5026658 | Method of making a trench capacitor dram cell | Genshu Fuse, Toshio Yamada, Masaki Fukumoto | 1991-06-25 |
| 4920390 | Semiconductor memory device and method of fabricating the same | Genshu Fuse, Toshio Yamada, Masaki Fukumoto | 1990-04-24 |