Issued Patents All Time
Showing 51–75 of 101 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7476485 | Resist lower layer film material and method for forming a pattern | Jun Hatakeyama | 2009-01-13 |
| 7378215 | Positive photoresist composition | Hiromasa Yamaguchi | 2008-05-27 |
| 7214743 | Resist lower layer film material and method for forming a pattern | Jun Hatakeyama | 2007-05-08 |
| 7175960 | Positive resist composition and patterning process | Tomoyoshi Furihata | 2007-02-13 |
| 7132220 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective film | Kazuhiro Arai, Satoshi Asai | 2006-11-07 |
| 7060761 | Epoxy resin compositions | Kazuhiro Arai, Satoshi Asai | 2006-06-13 |
| 7041766 | Colorless and transparent polyimidesilicone resin having thermosetting functional groups | Yoshinori Yoneda, Michihiro Sugo | 2006-05-09 |
| 6911292 | Positive resist composition and patterning process | Tomoyoshi Furihata | 2005-06-28 |
| 6899991 | Photo-curable resin composition, patterning process, and substrate protecting film | Kazumi Noda, Toshihiko Fujii, Kazuhiro Arai, Satoshi Asai | 2005-05-31 |
| 6866982 | Resist composition and patterning process | Yoshinori Hirano, Toshihiko Fujii, Hiromasa Yamaguchi | 2005-03-15 |
| 6867325 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat | Satoshi Asai, Toshihiko Fujii | 2005-03-15 |
| 6790581 | Hybrid compound, resist, and patterning process | Tomoyoshi Furihata | 2004-09-14 |
| 6773858 | Positive photoresist composition | Kyoko Soga, Tomoyoshi Furihata | 2004-08-10 |
| 6723432 | Electrode-forming compositions and electrode members | Michihiro Sugo | 2004-04-20 |
| 6706841 | Solventless polyimide silicone resin compositions | Michihiro Sugo, Akira Yamamoto | 2004-03-16 |
| 6703133 | Polyimide silicone resin, its solution composition, and polyimide silicone resin film | Michihiro Sugo | 2004-03-09 |
| 6635400 | Resist composition and patterning process | Kazuhiro Nishikawa, Yoshinori Hirano, Katsuya Takemura | 2003-10-21 |
| 6590010 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating | Takafumi Ueda, Tomoyoshi Furihata | 2003-07-08 |
| 6558867 | Lift-off resist compositions | Kazumi Noda, Tomoyoshi Furihata | 2003-05-06 |
| 6538093 | Polyimide silicone resin, process for its production, and polyimide silicone resin composition | Michihiro Sugo | 2003-03-25 |
| 6476620 | Electrostatic capacity sensor | Ryochi Kato | 2002-11-05 |
| 6456198 | Fence sensor | Ryochi Kato, Kunihide Kamiyama, Kiichi Seino | 2002-09-24 |
| 6451496 | Heat-curable photosensitive compositions | Takafumi Ueda, Kenji Araki | 2002-09-17 |
| 6440646 | Positive resist composition suitable for lift-off technique and pattern forming method | Takafumi Ueda, Toshihiko Fujii, Miki Kobayashi | 2002-08-27 |
| 6437058 | Polymers and positive resist compositions | Tomoyoshi Furihata, Yoshinori Hirano | 2002-08-20 |