Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11545340 | Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the same | Jong Hwan An, Hong Won Lee, Jae Bak SHIM | 2023-01-03 |
| 11244847 | Substrate treating apparatus and substrate treating method | Harutyun Melikyan, Jong Hwan An, Jamyung Gu, Sang Kee LEE, Young Bin Kim | 2022-02-08 |
| 11195705 | Plasma generating unit and substrate treating apparatus comprising the same | Ogsen Galstyan, Junghwan Lee, Jong Hwan An | 2021-12-07 |
| 10867775 | Apparatus and method for treating substrate | Jamyung Gu, Jong Hwan An, Saewon Na, Jun Ho Lee, Jungmo Gu | 2020-12-15 |
| 10563919 | Method, system, and apparatus for controlling a temperature of a substrate in a plasma processing chamber | Jung Min Won, Ik Jin Choi, Hyo Seong SEONG | 2020-02-18 |
| 10319566 | Apparatus for supplying power and apparatus for treating substrate including the same | Harutyun Melikyan, Ogsen Galstyan, Junghwan Lee, Jong Hwan An | 2019-06-11 |
| 6797109 | Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates | Jeong-hyuck Park, Hee-duk Kim, Jung-hun Cho, Jong-wook Choi, Sung-bum Cho +6 more | 2004-09-28 |
| 6740550 | Methods of manufacturing semiconductor devices having chamfered silicide layers therein | Chang-Won Choi, Dae-Hyuk Chung, Woo-Sik Kim, Yeo-cheol Yoon, Bum Su Kim +2 more | 2004-05-25 |
| 6464794 | Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates | Jeong-hyuck Park, Hee-duk Kim, Jung-hun Cho, Jong-wook Choi, Sung-bum Cho +6 more | 2002-10-15 |
| 6437411 | Semiconductor device having chamfered silicide layer and method for manufacturing the same | Chang-Won Choi, Dae-Hyuk Chung, Woo-Sik Kim, Yeo-cheol Yoon, Bum Su Kim +2 more | 2002-08-20 |