TP

Tai-Su Park

Samsung: 37 patents #3,051 of 75,807Top 5%
📍 Seoul, KR: #1,305 of 39,741 inventorsTop 4%
Overall (All Time): #90,590 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 1–25 of 37 patents

Patent #TitleCo-InventorsDate
9312124 Methods of fabricating gate insulating layers in gate trenches and methods of fabricating semiconductor devices including the same Gun-Joong Lee, Young Dong LEE, Sang Chul Han, Joo-Byoung Yoon 2016-04-12
9190495 Recessed channel array transistors, and semiconductor devices including a recessed channel array transistor Jeong-Do Ryu, Dong Chan Kim, Seong Hoon Jeong, Si-Young Choi, Yu-Gyun Shin +2 more 2015-11-17
9184086 Methods of fabricating semiconductor device having shallow trench isolation (STI) Mi-Young SEO, Sung-wook Park 2015-11-10
9054037 Method of fabricating semiconductor device Dong Chan Kim, Ju Eun Kim, Ki Hong Nam 2015-06-09
8835275 Semiconductor devices having nitrided gate insulating layer and methods of fabricating the same Jin Hyuk Choi, Sang Chul Han, Jung-Sup Oh, Young Dong LEE 2014-09-16
8691649 Methods of forming recessed channel array transistors and methods of manufacturing semiconductor devices Jung-Sup Oh, Gun-Joong Lee, Jung-Soo An, Dong-Kyu Lee, Jung Geun PARK +7 more 2014-04-08
8501611 Methods of forming integrated circuit devices having electrically conductive layers therein with partially nitridated sidewalls Jeong-Do Ryu, Si-Young Choi, Yu-Gyun Shin, Dong Chan Kim, Jong-Ryeol Yoo +2 more 2013-08-06
8252681 Methods of forming integrated circuit devices having electrically conductive layers therein with partially nitridated sidewalls Jeong-Do Ryu, Si-Young Choi, Yu-Gyun Shin, Dong Chan Kim, Jong-Ryeol Yoo +2 more 2012-08-28
7968442 Fin field effect transistor and method of fabricating the same Jong-Hoon Kang, Dong Chan Kim, Yu-Gyun Shin, Jeong-Do Ryu, Seong Hoon Jeong 2011-06-28
7807543 Methods of manufacturing trench isolation structures using selective plasma ion immersion implantation and deposition (PIIID) Dong-Woon Shin, Si-Young Choi, Soo-Jin Hong, Mi Jin Kim 2010-10-05
7785985 Methods of manufacturing semiconductor devices Dong-Woon Shin, Si-Young Choi, Soo-Jin Hong, Mi Jin Kim 2010-08-31
7459359 Methods of fabricating vertical channel field effect transistors having insulating layers thereon Eui-Joon Yoon, U-in Chung, Si-Young Choi, Jong Ho Lee 2008-12-02
7351622 Methods of forming semiconductor device Gyoung-Ho Buh, Chang-Woo Ryoo, Yu-Gyun Shin, Jin-Wook Lee 2008-04-01
7288823 Double gate field effect transistor and method of manufacturing the same Jae-Mun Youn, Dong-Gun Park, Gyo-young Jin, Yoshida Makoto 2007-10-30
7148541 Vertical channel field effect transistors having insulating layers thereon Eui-Joon Yoon, U-in Chung, Si-Young Choi, Jong Ho Lee 2006-12-12
7015106 Double gate field effect transistor and method of manufacturing the same Jae-Man Yoon, Dong-Gun Park, Gyo-young Jin, Yoshida Makoto 2006-03-21
6900090 Semiconductor device having a trench isolation structure and method for fabricating the same 2005-05-31
6717231 Trench isolation regions having recess-inhibiting layers therein that protect against overetching Sung-Eui Kim, Keum-Joo Lee, In-Seak Hwang, Young-sun Koh, Dong-Ho Ahn +1 more 2004-04-06
6645866 Method of fabricating a semiconductor device using trench isolation method including hydrogen annealing step Kyung Won Park, Jung-Woo Park, Won-sang Song 2003-11-11
6627514 Semiconductor device having a Y-shaped isolation layer and simplified method for manufacturing the Y-shaped isolation layer to prevent divot formation Kyung Won Park, Sung Jin Kim 2003-09-30
6617662 Semiconductor device having a trench isolation structure 2003-09-09
6537914 Integrated circuit device isolation methods using high selectivity chemical-mechanical polishing Moon-han Park, Kyung Won Park, Han-Sin Lee, Jung-yup Kim, Chang-Ki Hong +1 more 2003-03-25
6511888 Method of fabricating a semiconductor device using trench isolation method including hydrogen annealing step Kyung Won Park, Jung-Woo Park, Won-sang Song 2003-01-28
6482715 Method of forming shallow trench isolation layer in semiconductor device Ho-Kyu Kang, Dong-Ho Ahn, Moon-han Park 2002-11-19
6465866 Trench isolation regions having trench liners with recessed ends Moon-han Park, Kyung Won Park, Han-Sin Lee 2002-10-15