SK

Sung-Eui Kim

Samsung: 17 patents #7,989 of 75,807Top 15%
GC Goldstar Co.: 1 patents #307 of 863Top 40%
Overall (All Time): #249,224 of 4,157,543Top 6%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11955578 Optoelectronic apparatus and method of manufacturing the same Jong Won Chung, Sukho Choi, Sung-kwan Heo, Yongchul Kim 2024-04-09
10037999 Semiconductor device including landing pad for connecting substrate and capacitor Dae-Ik Kim, Hyoung-sub Kim, Hoon Jeong 2018-07-31
9613966 Semiconductor device Dae-Ik Kim, Hyoung-sub Kim 2017-04-04
9431476 Semiconductor devices including capacitors and methods of manufacturing the same Young-Seung Cho, Ji-Young Kim, Hoon Jeong, Chan-Won Kim, Jong-Bom Seo +2 more 2016-08-30
9349633 Semiconductor devices and methods of manufacturing the same Dae-Ik Kim, Hyoung-sub Kim, Sung-Kwan Choi 2016-05-24
9330960 Semiconductor devices including capacitors Young-Seung Cho, Ji-Young Kim, Hoon Jeong, Chan-Won Kim, Jong-Bom Seo +2 more 2016-05-03
7714325 Trench isolation structure Do Hyung Kim 2010-05-11
7387943 Method for forming layer for trench isolation structure Do Hyung Kim 2008-06-17
6914316 Semiconductor trench isolation structure Eun-Jung Yun 2005-07-05
6893982 Method for forming a thin film, methods for forming a gate electrode and transistor using the same, and a gate electrode manufactured using the same 2005-05-17
6794263 Method of manufacturing a semiconductor device including alignment mark Kong-Soo Lee, Young-Wook Park, Jae-Jong Han, Gi Hyun Hwang, Kyoung-Seok Kim +1 more 2004-09-21
6723662 Methods of forming gate oxide films in integrated circuit devices using wet or dry oxidization processes with reduced chloride Kong-Soo Lee, Jae-Jong Han 2004-04-20
6717231 Trench isolation regions having recess-inhibiting layers therein that protect against overetching Keum-Joo Lee, In-Seak Hwang, Young-sun Koh, Dong-Ho Ahn, Moon-han Park +1 more 2004-04-06
6461937 Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetching Keum-Joo Lee, In-Seak Hwang, Young-sun Koh, Dong-Ho Ahn, Moon-han Park +1 more 2002-10-08
6093622 Isolation method of semiconductor device using second pad oxide layer formed through chemical vapor deposition (CVD) Dong-Ho Ahn, Yu-Gyun Shin 2000-07-25
5824594 Integrated circuit device isolating methods including silicon spacers and oxidation barrier films Young-Dae Kim 1998-10-20
5677232 Methods of fabricating combined field oxide/trench isolation regions Soo-Jin Hong 1997-10-14
5581300 Solid state image sensor array having photochromic layer surrounded by passive layer for multiple photoelectric conversion elements in the array 1996-12-03