Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11955578 | Optoelectronic apparatus and method of manufacturing the same | Jong Won Chung, Sukho Choi, Sung-kwan Heo, Yongchul Kim | 2024-04-09 |
| 10037999 | Semiconductor device including landing pad for connecting substrate and capacitor | Dae-Ik Kim, Hyoung-sub Kim, Hoon Jeong | 2018-07-31 |
| 9613966 | Semiconductor device | Dae-Ik Kim, Hyoung-sub Kim | 2017-04-04 |
| 9431476 | Semiconductor devices including capacitors and methods of manufacturing the same | Young-Seung Cho, Ji-Young Kim, Hoon Jeong, Chan-Won Kim, Jong-Bom Seo +2 more | 2016-08-30 |
| 9349633 | Semiconductor devices and methods of manufacturing the same | Dae-Ik Kim, Hyoung-sub Kim, Sung-Kwan Choi | 2016-05-24 |
| 9330960 | Semiconductor devices including capacitors | Young-Seung Cho, Ji-Young Kim, Hoon Jeong, Chan-Won Kim, Jong-Bom Seo +2 more | 2016-05-03 |
| 7714325 | Trench isolation structure | Do Hyung Kim | 2010-05-11 |
| 7387943 | Method for forming layer for trench isolation structure | Do Hyung Kim | 2008-06-17 |
| 6914316 | Semiconductor trench isolation structure | Eun-Jung Yun | 2005-07-05 |
| 6893982 | Method for forming a thin film, methods for forming a gate electrode and transistor using the same, and a gate electrode manufactured using the same | — | 2005-05-17 |
| 6794263 | Method of manufacturing a semiconductor device including alignment mark | Kong-Soo Lee, Young-Wook Park, Jae-Jong Han, Gi Hyun Hwang, Kyoung-Seok Kim +1 more | 2004-09-21 |
| 6723662 | Methods of forming gate oxide films in integrated circuit devices using wet or dry oxidization processes with reduced chloride | Kong-Soo Lee, Jae-Jong Han | 2004-04-20 |
| 6717231 | Trench isolation regions having recess-inhibiting layers therein that protect against overetching | Keum-Joo Lee, In-Seak Hwang, Young-sun Koh, Dong-Ho Ahn, Moon-han Park +1 more | 2004-04-06 |
| 6461937 | Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetching | Keum-Joo Lee, In-Seak Hwang, Young-sun Koh, Dong-Ho Ahn, Moon-han Park +1 more | 2002-10-08 |
| 6093622 | Isolation method of semiconductor device using second pad oxide layer formed through chemical vapor deposition (CVD) | Dong-Ho Ahn, Yu-Gyun Shin | 2000-07-25 |
| 5824594 | Integrated circuit device isolating methods including silicon spacers and oxidation barrier films | Young-Dae Kim | 1998-10-20 |
| 5677232 | Methods of fabricating combined field oxide/trench isolation regions | Soo-Jin Hong | 1997-10-14 |
| 5581300 | Solid state image sensor array having photochromic layer surrounded by passive layer for multiple photoelectric conversion elements in the array | — | 1996-12-03 |