{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Physical vapor deposition (PVD) target having low friction pads", "item": "https://www.patentleaderboard.com/patent/9960021"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Physical vapor deposition (PVD) target having low friction pads

Physical vapor deposition (PVD) target having low friction pads

US Patent 9960021 · Granted May 1, 2018

Estimated economic value: $18,276,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reduced substrate process chamber cavity volume2025
Methods and apparatus for wafer detection2025
Substrate processing module and method of moving a workpiece2025
Apparatus for controlling lift pin movement2025
Process chamber collimator2025
Molybdenum monolithic physical vapor deposition target2025
Broadband supply circuitry for a plasma processing system2025
Semiconductor process equipment2025
Apparatus for improved high pressure plasma processing2025
Methods and apparatus for physical vapor deposition (PVD) dielectric deposition2025
Floating pin for substrate transfer2025
Shutter disk for physical vapor deposition (PVD) chamber2025