Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Measuring system for measuring an imaging quality of an EUV lens

Measuring system for measuring an imaging quality of an EUV lens

US Patent 9494483 · Granted Nov 15, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for characterizing a microlithographic mask2024
Measurement apparatus for measuring a wavefront aberration of an imaging optical2022
Measurement apparatus for measuring a wavefront aberration of an imaging optical2022
Method and device for calibrating a diffractive measuring structure2022
Pupil facet mirror, illumination optics and optical system for a projection lith2022
Image sensor, position sensor device, lithography system, and method for operati2022
Pupil facet mirror, illumination optics and optical system for a projection lith2021
Illumination optical device for projection lithography2021
Lithography apparatus comprising a plurality of individually controllable write 2021
Appliance for the moiré measurement of an optical test object2021
Illumination optical element for projection lithography2021
Method and device for characterizing a mask for microlithography2020