Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for supplying a cleaning gas into a process chamber

Method and system for supplying a cleaning gas into a process chamber

US Patent 9206511 · Granted Dec 8, 2015

Estimated economic value: $11,073,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Processes for depositing SiB films2025
Inclusion of special roller to avoid creasing, wrinkling and distortion of flexi2025
AFE (active far edge) heater/bipolar ESC with simplified and optimized structure2025
Ion implantation for reduced hydrogen incorporation in amorphous silicon2025
Showerhead design to control stray deposition2025
Showerhead design to control stray deposition2025
Evaporator for effective surface area evaporation2025
PECVD of SiBN thin films with low leakage current2025
Vacuum interrupter with slow opening solenoid core inside to shorten the length 2025
Rotary reactor for uniform particle coating with thin films2025
Chamber configurations and processes for particle control2025
Systems and methods of seasoning electrostatic chucks with dielectric seasoning 2025