Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material

Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material

US Patent 8932959 · Granted Jan 13, 2015

Estimated economic value: $21,367,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for digital control of ion energy distribution in a plasma2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Selective attachment to enhance SiO2:SiNx etch selectivity2025
Method for forming integrated circuit structures2025
Method for forming integrated circuit structures2025
Methods and apparatus for processing a substrate2025
Directional selective fill for silicon gap fill processes2025
Radio-frequency (RF) matching network for fast impedance tuning2025
Wafer to baseplate arc prevention using textured dielectric2025
Inductively coupled plasma source with radial coil network2025
Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025
Ion energy control on electrodes in a plasma reactor2025