Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Graded ARC for high NA and immersion lithography

Graded ARC for high NA and immersion lithography

US Patent 8125034 · Granted Feb 28, 2012

Estimated economic value: $8,688,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Multi color stack for self aligned dual pattern formation for multi purpose devi2025
System and method for radical and thermal processing of substrates2025
Integrated flowable low-k gap-fill and plasma treatment2025
Treatment methods for titanium nitride films2025
Method of in situ ceramic coating deposition2025
Processing chamber deposition confinement2025
Ultra-high modulus and etch selectivity boron-carbon hardmask films2025
Dual RF for controllable film deposition2025
Plasma-enhanced chemical vapor deposition of carbon hard-mask2024
Methods, systems, and apparatus for processing substrates using one or more amor2024
Highly etch selective amorphous carbon film2024
Electrostatic chucking process2024