{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method of depositing boron nitride and boron nitride-derived materials", "item": "https://www.patentleaderboard.com/patent/8084105"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of depositing boron nitride and boron nitride-derived materials

Method of depositing boron nitride and boron nitride-derived materials

US Patent 8084105 · Granted Dec 27, 2011

Estimated economic value: $8,284,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-aligned double patterning with spatial atomic layer deposition2025
Self-aligned double patterning with spatial atomic layer deposition2025
Self-aligned double patterning with spatial atomic layer deposition2025
Integrated low k recovery and ALD metal deposition process for advanced technolo2025
Methods and apparatus for low temperature silicon nitride films2025
Methods and apparatus for low temperature silicon nitride films2025
Methods and apparatus for selective etch stop capping and selective via open for2025
Thin layer deposition with plasma pulsing2025
Sequential plasma and thermal treatment2024
RF pulsing assisted low-k film deposition with high mechanical strength2024
Single precursor low-k film deposition and UV cure for advanced technology node2024
Methods for metal oxide post-treatment2024