Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Mask and method to pattern chromeless phase lithography contact hole

Mask and method to pattern chromeless phase lithography contact hole

US Patent 8057968 · Granted Nov 15, 2011

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System, method and apparatus for developing smart contract2024
Trench capacitor having improved capacitance and fabrication method thereof2023
Method for fabricating semiconductor memory device with buried capacitor and fin2023
Stacked capacitor with horizontal and vertical fin structures and method for mak2022
Semiconductor memory device with buried capacitor and fin-like electrodes2022
Trench capacitor having improved capacitance and fabrication method thereof2021
Semiconductor memory device with shallow buried capacitor and fabrication method2021
Medical body surface sticking ultrasonic probe2020
Multi-project wafer with IP protection by reticle mask pattern modification2018
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, a2017
Pellicles and devices comprising a photomask and the pellicle2016
Pellicles and devices comprising a photomask and the pellicle2016