Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for fabricating semiconductor memory device with buried capacitor and fin-like electrodes

Method for fabricating semiconductor memory device with buried capacitor and fin-like electrodes

US Patent 11610893 · Granted Mar 21, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Trench capacitor having improved capacitance and fabrication method thereof2023
Trench capacitor having improved capacitance and fabrication method thereof2023
Method of fabricating magnetic memory device2023
Physically unclonable function circuit having lower gate-to-source/drain breakdo2022
One-time programmable memory device and fabrication method thereof2022
Stacked capacitor with horizontal and vertical fin structures and method for mak2022
Stacked capacitor with horizontal and vertical fin structures and method for mak2022
1.5-transistor (1.5T) one time programmable (OTP) memory with thin gate to drain2022
Semiconductor memory device with buried capacitor and fin-like electrodes2022
Semiconductor memory device with buried capacitor and fin-like electrodes2022
Magnetic memory device with multiple sidewall spacers covering sidewall of MTJ e2022
Magnetic memory device and method for manufacturing the same2021