Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi-project wafer with IP protection by reticle mask pattern modification

Multi-project wafer with IP protection by reticle mask pattern modification

US Patent 9947645 · Granted Apr 17, 2018

Estimated economic value: $1,989,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor integrated circuit device and wearable device2023
Semiconductor integrated circuit device with SOTE and MOS transistors2022
Ionizing radiation blocking in IC chip to reduce soft errors2020
Chip-to-chip and chip-to-substrate interconnections in multi-chip semiconductor 2019
Semiconductor integrated circuit device and wearable device2019
Split probe pad structure and method2019
Stress-resilient chip structure and dicing process2019
IC structure on two sides of substrate and method of forming2018
IC structure including TSV having metal resistant to high temperatures and metho2018
Semiconductor device and manufacturing method thereof2018
Semiconductor integrated circuit device and wearable device2018
Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, a2017