Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Marker structure, mask pattern, alignment method and lithographic method and apparatus

Marker structure, mask pattern, alignment method and lithographic method and apparatus

US Patent 7466413 · Granted Dec 16, 2008

Estimated economic value: $4,882,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Metrology method, target and substrate2025
Method for calibrating simulation process based on defect-based process window2025
Methods and apparatus for obtaining diagnostic information relating to an indust2025
Apparatus and method for property joint interpolation and prediction2025
Patterning device and method of use thereof2025
Method for adjusting a target feature in a model of a patterning process based o2025
Method and apparatus for photolithographic imaging2024
Methods and apparatus for obtaining diagnostic information relating to an indust2024
Method for adjusting a target feature in a model of a patterning process based o2023
Method and apparatus for angular-resolved spectroscopic lithography characteriza2022
Lithographic method and lithographic apparatus2022
Metrology method, target and substrate2022