Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Shield or ring surrounding semiconductor workpiece in plasma chamber

Shield or ring surrounding semiconductor workpiece in plasma chamber

US Patent 6689249 · Granted Feb 10, 2004

Estimated economic value: $27,822,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of forming retaining ring with shaped surface2023
Nanocrystalline magnetic conductive sheet for wireless charging and preparation 2023
Retaining ring with shaped surface and method of forming2023
Retaining ring with shaped surface2022
Retaining ring with shaped surface2020
Temperature adjusting apparatus and method for a focus ring2020
Retaining ring with Shaped Surface2018
Retaining ring with shaped surface2015
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced p2015
Pulsed bias plasma process to control microloading2013
Retaining ring with shaped surface2013
Method of controlling etch microloading for a tungsten-containing layer2013