Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Target sidewall design to reduce particle generation during magnetron sputtering

Target sidewall design to reduce particle generation during magnetron sputtering

US Patent 6620296 · Granted Sep 16, 2003

Estimated economic value: $46,286,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Composition for regulating production of interfering ribonucleic acid2025
Composition for regulating production of interfering ribonucleic acid2025
Composition for regulating production of interfering ribonucleic acid2025
Composition for regulating production of interfering ribonucleic acid2025
Rating substrate support assemblies based on impedance circuit electron flow usi2025
Symmetric plasma source to generate pie-shaped treatment2024
Metal oxide preclean chamber with improved selectivity and flow conductance2024
Smart dynamic load simulator for RF power delivery control system2024
Cleaning of SIN with CCP plasma or RPS clean2024
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) 2024
Methods and apparatus for reducing sputtering of a grounded shield in a process 2024
Cleaning of sin with CCP plasma or RPS clean2024