Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for forming a dielectric film using helium as a carrier gas

Method and apparatus for forming a dielectric film using helium as a carrier gas

US Patent 6599574 · Granted Jul 29, 2003

Estimated economic value: $37,730,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-aligned double patterning with spatial atomic layer deposition2025
Integrated low k recovery and ALD metal deposition process for advanced technolo2025
System architecture of manufacturing of semiconductor wafers2025
Methods and apparatus for low temperature silicon nitride films2025
Directional selective deposition2025
Forming films with improved film quality2025
Isotropic silicon nitride removal2025
Ultra high-k hafnium oxide and hafnium zirconium oxide films2025
Methods and apparatus for carbon compound film deposition2025
Monolithic complementary field-effect transistors having carbon-doped release la2025
Metal oxide resist patterning with electrical field guided post-exposure bake2025
Chamber and methods of treating a substrate after exposure to radiation2024