Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of depositing a thick titanium nitride film

Method of depositing a thick titanium nitride film

US Patent 6548402 · Granted Apr 15, 2003

Estimated economic value: $39,567,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Low temperature deposition of iridium containing films2024
Low temperature deposition of iridium containing films2023
Apparatus for increasing flux from an ampoule2023
Apparatus and method for providing uniform flow of gas2022
Method and apparatuses for reducing porogen accumulation from a UV-cure chamber2021
Apparatus for increasing flux from an ampoule2021
High temperature process chamber lid2020
Doped tantalum nitride for copper barrier applications2020
Apparatus and methods to remove residual precursor inside gas lines post-deposit2020
Deposition of cobalt films with high deposition rate2020
Methods of depositing metal films using metal oxyhalide precursors2019
Apparatus and method for providing uniform flow of gas2019