Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions

Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions

US Patent 6368987 · Granted Apr 9, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Thermal etching of ruthenium2025
Metal hard mask integration2025
Selective film formation using a self-assembled monolayer2025
Conductive superlattice structures and methods of forming the same2025
System for backside deposition of a substrate2025
Method for filling recessed features in semiconductor devices with a low-resisti2025
Method of lithium extraction from sedimentary clay2025
System for backside deposition of a substrate2024
Semiconductor processing systems with in-situ electrical bias2024
Method for filling recessed features in semiconductor devices with a low-resisti2023
Method for forming and using stress-tuned silicon oxide films in semiconductor d2022
Semiconductor apparatus having stacked gates and method of manufacture thereof2022