Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for cleaning by-products from plasma chamber surfaces

Method and apparatus for cleaning by-products from plasma chamber surfaces

US Patent 5756400 · Granted May 26, 1998

Estimated economic value: $31,043,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Water vapor plasma to enhance surface hydrophilicity2025
Hybrid dynamic vision sensor and CMOS device for motion compensation2025
Semiconductor processing system2024
Automatic kerf offset mapping and correction system for laser dicing2024
Laser scribing trench opening control in wafer dicing using hybrid laser scribin2023
Water soluble organic-inorganic hybrid mask formulations and their applications2023
Electrostatic chuck with reduced current leakage for hybrid laser scribing and p2023
Non-permeable substrate carrier for electroplating2022
Hybrid wafer dicing approach using a split beam laser scribing process and plasm2022
Water soluble organic-inorganic hybrid mask formulations and their applications2021
Plasma reactor for ultra-high aspect ratio etching and etching method thereof2021
Article of adornment with interchangeable parts2021