Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

US Patent 11314174 · Granted Apr 26, 2022

Estimated economic value: $57,107,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for controlling a manufacturing process and associated apparatuses2025
Method of controlling a patterning process, device manufacturing method2025
Method of controlling a patterning process, device manufacturing method2025
Method and apparatus to determine a patterning process parameter2025
Method and apparatus to determine a patterning process parameter2025
Computational metrology2025
Computational metrology2025
Identification of hot spots or defects by machine learning2025
Methods and patterning devices and apparatuses for measuring focus performance o2025
Methods and patterning devices and apparatuses for measuring focus performance o2025
Method and apparatus to determine a patterning process parameter2025
Method and apparatus to determine a patterning process parameter2025