Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi zone substrate support for ALD film property correction and tunability

Multi zone substrate support for ALD film property correction and tunability

US Patent 11236422 · Granted Feb 1, 2022

Estimated economic value: $175,197,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma enhanced atomic layer deposition of silicon-containing films2025
Plasma enhanced atomic layer deposition of silicon-containing films2025
Modulated atomic layer deposition2025
Multi-station semiconductor processing with independently adjustable pedestals2025
Impurity reduction in silicon-containing films2025
Apparatuses for uniform fluid delivery in a multi-station semiconductor processi2025
Plasma-enhanced deposition of film stacks2025
Machine learning techniques for generating predictions based on incomplete data2025
Dual zone heaters for metallic pedestals2025
Dynamic process control in semiconductor manufacturing2025
Rapid tuning of critical dimension non-uniformity by modulating temperature tran2025
Rapid tuning of critical dimension non-uniformity by modulating temperature tran2025