Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Additive core subtractive liner for metal cut etch processes

Additive core subtractive liner for metal cut etch processes

US Patent 11152489 · Granted Oct 19, 2021

Estimated economic value: $2,168,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fork sheet device with wrapped source and drain contact to prevent NFET to PFET 2025
Gate-all-around field-effect-transistor with wrap-around-channel inner spacer2025
Non-overlapping gate conductors for GAA transistors2025
Cross bar vertical FETs2025
Integration of nanosheets with bottom dielectric isolation and ideal diode2025
Stacked field effect transistor structure with independent gate control between 2025
Wraparound contact with reduced distance to channel2025
Multi-VT solution for replacement metal gate bonded stacked FET2025
FinFET gate cut after dummy gate removal2025
Strain generation and anchoring in gate-all-around field effect transistors2025
Formation of trench silicide source or drain contacts without gate damage2025
Stressed material within gate cut region2025