Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pulsed plasma deposition etch step coverage improvement

Pulsed plasma deposition etch step coverage improvement

US Patent 10950430 · Granted Mar 16, 2021

Estimated economic value: $56,717,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

PECVD of SiBN thin films with low leakage current2025
Steel sheet for hot-dip galvanizing, hot-dip galvanized steel sheet, and alloyed2025
Silicon oxide gap fill using capacitively coupled plasmas2025
Silicon oxide gap fill using capacitively coupled plasmas2025
Systems and methods of seasoning electrostatic chucks with dielectric seasoning 2025
Shaped showerhead for edge plasma modulation2025
Shaped showerhead for edge plasma modulation2025
Helium-free silicon formation2025
Profile shaping for control gate recesses2025
Modified stacks for 3D NAND2025
Modified stacks for 3D NAND2025
Systems and methods for depositing low-k dielectric films2025