Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for asymmetric deposition of metal on high aspect ratio nanostructures

Methods for asymmetric deposition of metal on high aspect ratio nanostructures

US Patent 10636655 · Granted Apr 28, 2020

Estimated economic value: $15,875,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for forming films on substrates2025
Low resistivity metal contact stack2025
Apparatus and method for controlling a flow process material to a deposition cha2025
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Gap fill methods using catalyzed deposition2025
Methods for controlling contact resistance in cobalt-titanium structures2025
Pulsing plasma treatment for film densification2025
Methods for removing etch stop layers2025
Method and apparatus of low temperature plasma enhanced chemical vapor depositio2025
Method of depositing metal films2025
Selective metal removal with flowable polymer2025
Impurity removal in doped ALD tantalum nitride2025