Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Projection system and minor and radiation source for a lithographic apparatus

Projection system and minor and radiation source for a lithographic apparatus

US Patent 10216093 · Granted Feb 26, 2019

Estimated economic value: $13,559,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Membrane for EUV lithography2025
Cooling hood for reticle2025
Component for use in a lithographic apparatus, method of protecting a component 2025
Vibration isolator for supporting a payload2025
Patterning device conditioning system and method2025
Lithographic system provided with a deflection apparatus for changing a trajecto2025
Metrology tool with position control of projection system2025
Oxygen-loss resistant top coating for optical elements2025
EUV collector mirror2025
Transmissive diffusor2025
Fluid transfer system in a charged particle system2025
Object holder, electrostatic sheet and method for making an electrostatic sheet2025