Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma activated conformal dielectric film deposition

Plasma activated conformal dielectric film deposition

US Patent 10043655 · Granted Aug 7, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor processing device2025
Method of tuning film properties of metal nitride using plasma2025
Plasma-enhanced deposition of film stacks2025
Plasma-enhanced deposition of film stacks2025
Vapor deposition of films comprising molybdenum2025
Method of reducing titanium nitride etching during tungsten film formation2025
Apparatus and methods for fine planar non-uniformity improvement2025
Structure including SiOCN layer and method of forming same2025
Mask encapsulation to prevent degradation during fabrication of high aspect rati2025
Gapfill of variable aspect ratio features with a composite PEALD and PECVD metho2025
Gapfill of variable aspect ratio features with a composite PEALD and PECVD metho2025
Carbon based depositions used for critical dimension control during high aspect 2025