NY

Naohito Yamada

NI Ngk Insulators: 47 patents #34 of 2,083Top 2%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
Overall (All Time): #59,080 of 4,157,543Top 2%
47
Patents All Time

Issued Patents All Time

Showing 26–47 of 47 patents

Patent #TitleCo-InventorsDate
8226865 Aluminum-nitride-based composite material, method for manufacturing the same, and member for a semiconductor manufacturing apparatus Yoshimasa Kobayashi, Akira Goto, Yuji Katsuda 2012-07-24
7629282 Aluminum nitride sintered body, semiconductor manufacturing device and method of manufacturing Jun Yoshikawa, Yoshimasa Kobayashi 2009-12-08
7605102 Aluminum nitride ceramic and semiconductor manufacturing member Yoshimasa Kobayashi, Toru Hayase 2009-10-20
7592280 Aluminum nitride sintered body, method of manufacturing aluminum nitride sintered body, and member Yoshimasa Kobayashi 2009-09-22
7422992 Aluminum nitride sintered body, semiconductor manufacturing member, and method of manufacturing aluminum nitride sintered body Naomi Teratani 2008-09-09
7332027 Method for manufacturing aluminum nitride single crystal Yoshimasa Kobayashi, Toru Hayase 2008-02-19
7288496 Aluminum nitride sintered body and method of evaluation for the same Yoshimasa Kobayashi, Toru Hayase 2007-10-30
7250215 Aluminum nitride sintered body containing carbon fibers and method of manufacturing the same Jun Yoshikawa, Hiroya SUGIMOTO 2007-07-31
7229940 Dense cordierite based sintered body and method of manufacturing the same Naomi Teratani, Hiroaki Sakai 2007-06-12
7211216 Aluminum nitride ceramic, semiconductor manufacturing member, and manufacturing method for aluminum nitride ceramic Yoshimasa Kobayashi, Toru Hayase 2007-05-01
7122490 Aluminum nitride materials and members for use in the production of semiconductors Yoshimasa Kobayashi, Toru Hayase, Naomi Teratani, Jun Yoshikawa 2006-10-17
7042697 Electrostatic chucks and electrostatically attracting structures Hideyoshi Tsuruta 2006-05-09
6491571 Substrate for use in wafer attracting apparatus and manufacturing method thereof Masashi Ohno, Takahiro Inoue, Kouji Kato 2002-12-10
6471779 Gas feed ceramic structure for semiconductor-producing apparatus Akifumi Nishio, Masahiro Hori 2002-10-29
6432208 Plasma processing apparatus Satoru Kawakami, Katsuhiko Iwabuchi, Ryo Kuwajima, Ryusuke Ushikoshi, Tetsuya Kawajiri 2002-08-13
6292346 Equipment for holding a semiconductor wafer, a method for manufacturing the same, and a method for using the same Masashi Ohno, Hirokazu Ichikawa, Tetsuya Kawajiri 2001-09-18
6174583 Aluminum nitride sintered body, metal including member, electrostatic chuck, method of producing aluminum nitride sintered body, and method of producing metal including member Yukimasa Mori, Yuki Bessho, Hiromichi Kobayashi 2001-01-16
6166432 Substrate for use in wafer attracting apparatus and manufacturing method thereof Masashi Ohno, Takahiro Inoue, Kouji Kato 2000-12-26
6134096 Electrostatic chuck Masashi Ohno, Ryusuke Ushikoshi 2000-10-17
5998320 Aluminum nitride sintered body, metal including member, electrostatic chuck, method of producing aluminum nitride sintered body, and method of producing metal including member Yukimasa Mori, Yuki Bessho, Hiromichi Kobayashi 1999-12-07
5946183 Electrostatic chuck Masashi Ohno, Ryusuke Ushikoshi 1999-08-31
4959258 Joined metal-ceramic assembly method of preparing the same Akihiko Yoshida 1990-09-25