Issued Patents All Time
Showing 1–25 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12134596 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | Takashi MAKINOSHIMA, Junya HORIUCHI | 2024-11-05 |
| 11852970 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | Hiroto KUDO, Takumi TOIDA, Takashi Sato | 2023-12-26 |
| 11747728 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | Junya HORIUCHI, Yu Okada, Takashi MAKINOSHIMA | 2023-09-05 |
| 11572430 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Youko Shimizu, Takashi MAKINOSHIMA, Takashi Sato | 2023-02-07 |
| 11480877 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | Takumi TOIDA, Takashi Sato, Youko Shimizu | 2022-10-25 |
| 11256170 | Compound, resist composition, and method for forming resist pattern using it | Takumi TOIDA, Takashi Sato, Youko Shimizu | 2022-02-22 |
| 11243467 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Youko Shimizu, Takashi MAKINOSHIMA, Takashi Sato | 2022-02-08 |
| 11143962 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | Takumi TOIDA, Takashi MAKINOSHIMA, Takashi Sato | 2021-10-12 |
| 11137686 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | Takumi TOIDA, Takashi MAKINOSHIMA, Takashi Sato | 2021-10-05 |
| 11130724 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | Takumi TOIDA, Takashi Sato | 2021-09-28 |
| 11067889 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | — | 2021-07-20 |
| 10745372 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | Takumi TOIDA, Takashi Sato, Takashi MAKINOSHIMA | 2020-08-18 |
| 10747112 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | Takumi TOIDA, Takashi MAKINOSHIMA | 2020-08-18 |
| 10723690 | (Meth)acryloyl compound and method for producing same | — | 2020-07-28 |
| 10642156 | Resist base material, resist composition and method for forming resist pattern | Takumi TOIDA, Takashi Sato, Youko Shimizu | 2020-05-05 |
| 10577323 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin | Kana OKADA, Junya HORIUCHI, Takashi MAKINOSHIMA | 2020-03-03 |
| 10550068 | Compound and method for producing same | — | 2020-02-04 |
| 10437148 | Resist material, resist composition and method for forming resist pattern | Takumi TOIDA, Takashi Sato | 2019-10-08 |
| 10377734 | Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition | Masako Yamakawa | 2019-08-13 |
| 10364314 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | Kana OKADA, Junya HORIUCHI, Takashi MAKINOSHIMA | 2019-07-30 |
| 10359701 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Takashi MAKINOSHIMA, Go Higashihara, Atsushi Okoshi | 2019-07-23 |
| 10338471 | Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Takashi MAKINOSHIMA, Go Higashihara, Atsushi Okoshi | 2019-07-02 |
| 10310377 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | Takashi MAKINOSHIMA | 2019-06-04 |
| 10303055 | Resist composition and method for forming resist pattern | Takashi Sato | 2019-05-28 |
| 10294183 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | Takashi MAKINOSHIMA | 2019-05-21 |