Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12134596 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | Junya HORIUCHI, Masatoshi Echigo | 2024-11-05 |
| 11747728 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | Junya HORIUCHI, Yu Okada, Masatoshi Echigo | 2023-09-05 |
| 11572430 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Youko Shimizu, Takashi Sato, Masatoshi Echigo | 2023-02-07 |
| 11243467 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Youko Shimizu, Takashi Sato, Masatoshi Echigo | 2022-02-08 |
| 11143962 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | Takumi TOIDA, Takashi Sato, Masatoshi Echigo | 2021-10-12 |
| 11137686 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | Takumi TOIDA, Takashi Sato, Masatoshi Echigo | 2021-10-05 |
| 10745372 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | Takumi TOIDA, Masatoshi Echigo, Takashi Sato | 2020-08-18 |
| 10747112 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | Takumi TOIDA, Masatoshi Echigo | 2020-08-18 |
| 10577323 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin | Kana OKADA, Junya HORIUCHI, Masatoshi Echigo | 2020-03-03 |
| 10364314 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | Kana OKADA, Junya HORIUCHI, Masatoshi Echigo | 2019-07-30 |
| 10359701 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Masatoshi Echigo, Go Higashihara, Atsushi Okoshi | 2019-07-23 |
| 10338471 | Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Masatoshi Echigo, Go Higashihara, Atsushi Okoshi | 2019-07-02 |
| 10310377 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | Masatoshi Echigo | 2019-06-04 |
| 10294183 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | Masatoshi Echigo | 2019-05-21 |
| 9920024 | Method for purifying compound or resin | Masatoshi Echigo, Naoya Uchiyama | 2018-03-20 |
| 9828355 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Masatoshi Echigo, Naoya Uchiyama | 2017-11-28 |
| 9809601 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Masatoshi Echigo, Naoya Uchiyama | 2017-11-07 |
| 7871554 | Process for producing polyimide film | Jitsuo Oishi, Ko Kedo, Shuta Kihara | 2011-01-18 |
| 7659360 | Low water-absorptive polyimide resin and method for producing same | Shuta Kihara | 2010-02-09 |