Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11911341 | Multilayer vessel, and application thereof | Shota Arakawa, Toshiya Naito, Satoshi Okada, Kenichiro Usuda, Haruka OKAZAKI +1 more | 2024-02-27 |
| 11852970 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | Hiroto KUDO, Masatoshi Echigo, Takashi Sato | 2023-12-26 |
| 11572430 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Youko Shimizu, Takashi MAKINOSHIMA, Takashi Sato, Masatoshi Echigo | 2023-02-07 |
| 11480877 | Resist composition, method for forming resist pattern, and polyphenol compound used therein | Masatoshi Echigo, Takashi Sato, Youko Shimizu | 2022-10-25 |
| 11256170 | Compound, resist composition, and method for forming resist pattern using it | Masatoshi Echigo, Takashi Sato, Youko Shimizu | 2022-02-22 |
| 11243467 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Youko Shimizu, Takashi MAKINOSHIMA, Takashi Sato, Masatoshi Echigo | 2022-02-08 |
| 11143962 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | Takashi MAKINOSHIMA, Takashi Sato, Masatoshi Echigo | 2021-10-12 |
| 11137686 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | Takashi MAKINOSHIMA, Takashi Sato, Masatoshi Echigo | 2021-10-05 |
| 11130724 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | Takashi Sato, Masatoshi Echigo | 2021-09-28 |
| 10745372 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | Masatoshi Echigo, Takashi Sato, Takashi MAKINOSHIMA | 2020-08-18 |
| 10747112 | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method | Masatoshi Echigo, Takashi MAKINOSHIMA | 2020-08-18 |
| 10642156 | Resist base material, resist composition and method for forming resist pattern | Masatoshi Echigo, Takashi Sato, Youko Shimizu | 2020-05-05 |
| 10437148 | Resist material, resist composition and method for forming resist pattern | Takashi Sato, Masatoshi Echigo | 2019-10-08 |