GH

Go Higashihara

MC Mitsubishi Gas Chemical Company: 10 patents #181 of 1,727Top 15%
📍 Kurashiki, JP: #84 of 838 inventorsTop 15%
Overall (All Time): #507,672 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
10359701 Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Kana OKADA, Takashi MAKINOSHIMA, Masatoshi Echigo, Atsushi Okoshi 2019-07-23
10338471 Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method Kana OKADA, Takashi MAKINOSHIMA, Masatoshi Echigo, Atsushi Okoshi 2019-07-02
10160824 Cyanate ester compound, curable resin composition containing said compound, and cured product of said composition Masayuki Katagiri, Kenji Arii, Yuuichi Sugano, Makoto Tsubuku 2018-12-25
9725551 Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and method for producing these Atsushi Okoshi 2017-08-08
9562130 Aromatic hydrocarbon formaldehyde resin, modified aromatic hydrocarbon formaldehyde resin and epoxy resin, and methods for producing these Atsushi Okoshi 2017-02-07
9316913 Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method Masatoshi Echigo, Naoya Uchiyama 2016-04-19
9200105 Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resin Naoya Uchiyama, Masatoshi Echigo 2015-12-01
9110373 Phenolic resin and material for forming underlayer film for lithography Naoya Uchiyama, Masatoshi Echigo 2015-08-18
8741553 Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern Naoya Uchiyama, Masatoshi Echigo 2014-06-03
8592134 Composition for forming base film for lithography and method for forming multilayer resist pattern Dai Oguro, Seiji Kita, Mitsuharu Kitamura, Masashi Ogiwara 2013-11-26