Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9897913 | Radiation-sensitive composition | Masatoshi Echigo | 2018-02-20 |
| 9605110 | Epoxy resin curing agent | Shuichi Ueno | 2017-03-28 |
| 9234986 | Polyester resin and optical lens | Takuya Minezaki, Takeshi Hirokane | 2016-01-12 |
| 9150491 | Bicyclohexane derivative compound and manufacturing method of the same | Masatoshi Echigo | 2015-10-06 |
| 8859787 | Glycol compound having dioxane structure and method for producing the same | Takuya Minezaki, Takeshi Hirokane | 2014-10-14 |
| 8846292 | Radiation-sensitive composition | Masatoshi Echigo | 2014-09-30 |
| 8846957 | Glycol compound having dioxane structure and method for producing the same | Takuya Minezaki, Takeshi Hirokane | 2014-09-30 |
| 8829247 | Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern | Hiromi Hayashi, Masatoshi Echigo | 2014-09-09 |
| 8802353 | Compound for resist and radiation-sensitive composition specification | Masatoshi Echigo | 2014-08-12 |
| 8748078 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | Hiromi Hayashi, Masatoshi Echigo | 2014-06-10 |
| 8674054 | Polyester resin and optical lens | Takuya Minezaki, Takeshi Hirokane | 2014-03-18 |
| 8592134 | Composition for forming base film for lithography and method for forming multilayer resist pattern | Go Higashihara, Seiji Kita, Mitsuharu Kitamura, Masashi Ogiwara | 2013-11-26 |
| 8563665 | Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound | Seiji Kita, Masashi Ogiwara, Mitsuharu Kitamura, Gou Higashihara | 2013-10-22 |
| 8524952 | Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound | Seiji Kita, Masashi Ogiwara, Mitsuharu Kitamura, Gou Higashihara | 2013-09-03 |
| 8519177 | Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound | Seiji Kita, Masashi Ogiwara, Mitsuharu Kitamura, Gou Higashihara | 2013-08-27 |
| 8350096 | Compound for resist and radiation-sensitive composition | Masatoshi Echigo | 2013-01-08 |
| 8324407 | Alcohol compound having dioxane structure and process for producing same | — | 2012-12-04 |
| 8110334 | Radiation-sensitive composition | Masatoshi Echigo | 2012-02-07 |
| 7919223 | Compound for resist and radiation-sensitive composition | Masatoshi Echigo | 2011-04-05 |
| 7871751 | Resist composition | Masatoshi Echigo | 2011-01-18 |
| 7067186 | Thermoplastic resin composition | Takeo Hayashi, Masahiro Kurokawa, Tsuyoshi Ikeda, Takeshi Hirokane | 2006-06-27 |
| 6740376 | Polyester based resin composition and molded product therefrom | Takeo Hayashi, Takeshi Hirokane, Masahiro Kurokawa | 2004-05-25 |
| 6447859 | Polyester resin and molded article | Koji Yamamoto, Takeo Hayashi, Takeshi Hirokane, Masahiro Kurokawa | 2002-09-10 |