MO

Masashi Ogiwara

MC Mitsubishi Gas Chemical Company: 7 patents #273 of 1,727Top 20%
📍 Okayama, JP: #187 of 1,590 inventorsTop 15%
Overall (All Time): #740,287 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8648152 Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereof Seiji Kita 2014-02-11
8592134 Composition for forming base film for lithography and method for forming multilayer resist pattern Dai Oguro, Go Higashihara, Seiji Kita, Mitsuharu Kitamura 2013-11-26
8586289 Aromatic hydrocarbon resin and composition for forming underlayer film for lithography Ryuji Ideno, Seiji Kita, Gou Higashihara 2013-11-19
8563665 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Seiji Kita, Mitsuharu Kitamura, Dai Oguro, Gou Higashihara 2013-10-22
8524952 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Seiji Kita, Mitsuharu Kitamura, Dai Oguro, Gou Higashihara 2013-09-03
8519177 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound Seiji Kita, Mitsuharu Kitamura, Dai Oguro, Gou Higashihara 2013-08-27
7772331 Method of producing low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin Seiji Kita 2010-08-10