Issued Patents All Time
Showing 26–50 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9920024 | Method for purifying compound or resin | Takashi MAKINOSHIMA, Naoya Uchiyama | 2018-03-20 |
| 9908831 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | Masako Yamakawa | 2018-03-06 |
| 9897913 | Radiation-sensitive composition | Dai Oguro | 2018-02-20 |
| 9828355 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Takashi MAKINOSHIMA, Naoya Uchiyama | 2017-11-28 |
| 9809601 | Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Takashi MAKINOSHIMA, Naoya Uchiyama | 2017-11-07 |
| 9785048 | Resist composition | Masaaki Takasuka, Yu Okada, Yumi Ochiai | 2017-10-10 |
| 9598392 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | Masako Yamakawa | 2017-03-21 |
| 9540339 | Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom | Masako Yamakawa | 2017-01-10 |
| 9464068 | Allyl compound and method for producing the same | — | 2016-10-11 |
| 9354516 | Resist composition | Masaaki Takasuka, Yu Okada, Yumi Ochiai | 2016-05-31 |
| 9316913 | Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method | Go Higashihara, Naoya Uchiyama | 2016-04-19 |
| 9239517 | Compound, radiation-sensitive composition and resist pattern formation method | — | 2016-01-19 |
| 9200105 | Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resin | Naoya Uchiyama, Go Higashihara | 2015-12-01 |
| 9182666 | Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation method | Masako Yamakawa | 2015-11-10 |
| 9150491 | Bicyclohexane derivative compound and manufacturing method of the same | Dai Oguro | 2015-10-06 |
| 9122153 | Cyclic compound, method for producing same, composition, and method for forming resist pattern | Masako Yamakawa | 2015-09-01 |
| 9110373 | Phenolic resin and material for forming underlayer film for lithography | Naoya Uchiyama, Go Higashihara | 2015-08-18 |
| 8969629 | Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method | Masaaki Takasuka, Yu Okada | 2015-03-03 |
| 8889919 | Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern | Hiromi Hayashi | 2014-11-18 |
| 8883937 | Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern | Hiromi Hayashi | 2014-11-11 |
| 8846292 | Radiation-sensitive composition | Dai Oguro | 2014-09-30 |
| 8829247 | Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern | Hiromi Hayashi, Dai Oguro | 2014-09-09 |
| 8802353 | Compound for resist and radiation-sensitive composition specification | Dai Oguro | 2014-08-12 |
| 8748078 | Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern | Hiromi Hayashi, Dai Oguro | 2014-06-10 |
| 8741553 | Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern | Go Higashihara, Naoya Uchiyama | 2014-06-03 |