YK

Yasuhiro Kawase

MC Mitsubishi Chemical: 19 patents #23 of 3,022Top 1%
DE Denso: 6 patents #2,220 of 11,792Top 20%
TU Tohoku University: 3 patents #210 of 1,680Top 15%
NS Nippon Soken: 3 patents #406 of 1,540Top 30%
WI Wingarc1St: 2 patents #7 of 15Top 50%
NU National University Corporation Tohoku University: 2 patents #36 of 170Top 25%
AC Advics Co.: 2 patents #250 of 686Top 40%
SO Soken: 1 patents #60 of 182Top 35%
NC Nihon Ceratec Co.: 1 patents #2 of 27Top 8%
SC Shin-Etsu Chemical Co.: 1 patents #1,340 of 2,176Top 65%
Overall (All Time): #133,216 of 4,157,543Top 4%
28
Patents All Time

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #TitleCo-InventorsDate
12189795 Chatbot control device and chatbot control method Hironori Watanabe, Naoto Kamijo 2025-01-07
11597896 Cleaning liquid, cleaning method, and method for producing semiconductor wafer Toshiaki Shibata, Ken Harada, Atsushi Ito, Tomohiro Kusano, Yutaro Takeshita 2023-03-07
11391499 Heat pump cycle device and valve device Daiki Kato, Masaaki Kawakubo, Tetsuya Ito, Ryohei Sugimura, Hiroshi Mieda 2022-07-19
11225125 Integrated valve device Tetsuya Ito, Masaaki Kawakubo, Daiki Kato, Ryohei Sugimura 2022-01-18
11115446 Chat system and chat management apparatus Hironori Watanabe, Takahito Abe 2021-09-07
11066627 Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate Tomohiro Kusano, Ken Harada 2021-07-20
10731770 Electric flow control valve and actuator Yukikatsu Ozaki, Mikio Matsuda, Tetsuya Itou, Sadahisa Onimaru, Hiroki Ishii 2020-08-04
10400151 Agglomerated boron nitride particles, composition containing said particles, and three- dimensional integrated circuit having layer comprising said composition Masanori Yamazaki, Mari Abe, Tomohide Murase, Makoto Ikemoto, Hideki Kiritani +1 more 2019-09-03
10125289 Composition for interlayer filler of layered semiconductor device, layered semiconductor device, and process for producing layered semiconductor device Masaya SUGIYAMA, Makoto Ikemoto, Hideki Kiritani, Masanori Yamazaki 2018-11-13
9960092 Interlayer filler composition for three-dimensional integrated circuit Makoto Ikemoto, Tomohide Murase, Makoto Takahashi, Takayoshi Hirai, Iho Kamimura 2018-05-01
9847298 Three-dimensional integrated circuit laminate, and interlayer filler for three-dimensional integrated circuit laminate Makoto Ikemoto, Hideki Kiritani 2017-12-19
9822294 Agglomerated boron nitride particles, composition containing said particles, and three-dimensional integrated circuit having layer comprising said composition Masanori Yamazaki, Mari Abe, Tomohide Murase, Makoto Ikemoto, Hideki Kiritani +1 more 2017-11-21
9508648 Three-dimensional integrated circuit laminate, and interlayer filler for three-dimensional integrated circuit laminate Makoto Ikemoto, Hideki Kiritani 2016-11-29
9476137 Metal oxide film, laminate, metal member and process for producing the same Tadahiro Ohmi, Yasuyuki Shirai, Hitoshi Morinaga, Masafumi Kitano, Fumikazu Mizutani +1 more 2016-10-25
9358967 Rotary pump and braking system having the same Kazunori Uchiyama, Naoki Hakamada, Kazuhide Uchida, Takahiro Yamaguchi, Tomoaki Kawabata +2 more 2016-06-07
9163627 Rotating pump and brake system using same Kazunori Uchiyama, Naoki Hakamada, Kazuhide Uchida, Takahiro Yamaguchi, Tomoaki Kawabata 2015-10-20
8642187 Structural member to be used in apparatus for manufacturing semiconductor or flat display, and method for producing the same Tadahiro Ohmi, Minoru Tahara 2014-02-04
8282807 Metal member having a metal oxide film and method of manufacturing the same Tadahiro Ohmi, Minoru Tahara 2012-10-09
8206833 Metal oxide film, laminate, metal member and process for producing the same Tadahiro Ohmi, Yasuyuki Shirai, Hitoshi Morinaga, Masafumi Kitano, Fumikazu Mizutani +1 more 2012-06-26
8124240 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure Tadahiro Ohmi, Yasuyuki Shirai, Hitoshi Morinaga, Masafumi Kitano, Fumikazu Mizutani +2 more 2012-02-28
8110534 Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device Makoto Ikemoto, Atsushi Itou, Makoto Ishikawa 2012-02-07
7906004 Method of forming oxide film by anodically oxidizing in an electrolyte solution Fumikazu Mizutani, Toshiaki Sakakihara, Makoto Ishikawa 2011-03-15
7870733 Fluid machine for rankine cycle Keiichi Uno, Hironori Asa, Yasuhiro Takeuchi, Hiroshi Ogawa, Hiroshi Kishita +2 more 2011-01-18
7621281 Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same Makoto Ikemoto, Hitoshi Morinaga 2009-11-24
7407569 Gold plating solution and gold plating method Fumikazu Mizutani, Hiroshi Takaha, Makoto Ishikawa 2008-08-05