Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10400151 | Agglomerated boron nitride particles, composition containing said particles, and three- dimensional integrated circuit having layer comprising said composition | Masanori Yamazaki, Mari Abe, Tomohide Murase, Yasuhiro Kawase, Hideki Kiritani +1 more | 2019-09-03 |
| 10125289 | Composition for interlayer filler of layered semiconductor device, layered semiconductor device, and process for producing layered semiconductor device | Masaya SUGIYAMA, Yasuhiro Kawase, Hideki Kiritani, Masanori Yamazaki | 2018-11-13 |
| 9960092 | Interlayer filler composition for three-dimensional integrated circuit | Yasuhiro Kawase, Tomohide Murase, Makoto Takahashi, Takayoshi Hirai, Iho Kamimura | 2018-05-01 |
| 9847298 | Three-dimensional integrated circuit laminate, and interlayer filler for three-dimensional integrated circuit laminate | Yasuhiro Kawase, Hideki Kiritani | 2017-12-19 |
| 9822294 | Agglomerated boron nitride particles, composition containing said particles, and three-dimensional integrated circuit having layer comprising said composition | Masanori Yamazaki, Mari Abe, Tomohide Murase, Yasuhiro Kawase, Hideki Kiritani +1 more | 2017-11-21 |
| 9508648 | Three-dimensional integrated circuit laminate, and interlayer filler for three-dimensional integrated circuit laminate | Yasuhiro Kawase, Hideki Kiritani | 2016-11-29 |
| 8110534 | Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device | Yasuhiro Kawase, Atsushi Itou, Makoto Ishikawa | 2012-02-07 |
| 7621281 | Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same | Yasuhiro Kawase, Hitoshi Morinaga | 2009-11-24 |
| 7541322 | Cleaning solution for substrate for semiconductor device and cleaning method | Hitoshi Morinaga | 2009-06-02 |
| 5698362 | 1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist pattern | Mineo Nishi, Koji Nakano, Tadashi Kusumoto, Yasuhiro Kawase | 1997-12-16 |
| 5635329 | Photosensitive resin composition and method for forming a pattern using the composition | Mineo Nishi, Koji Nakano | 1997-06-03 |