HM

Hitoshi Morinaga

FI Fujimi Incorporated: 17 patents #5 of 216Top 3%
MC Mitsubishi Chemical: 12 patents #72 of 3,022Top 3%
TU Tohoku University: 4 patents #157 of 1,680Top 10%
HC Hitachi Cable: 2 patents #313 of 1,086Top 30%
EB Ebara: 1 patents #1,014 of 1,611Top 65%
NC Nihon Ceratec Co.: 1 patents #2 of 27Top 8%
Overall (All Time): #112,663 of 4,157,543Top 3%
32
Patents All Time

Issued Patents All Time

Showing 1–25 of 32 patents

Patent #TitleCo-InventorsDate
11498182 Polishing method and polishing pad Toru Kamada, Koji Katayama, Takashi Horibe 2022-11-15
11446784 Chemical mechanical polishing apparatus for polishing workpiece Yu Ishii, Kenya Ito, Kazusei Tamai, Shingo OHTSUKI, Hiroshi Asano 2022-09-20
10920104 Abrasive, polishing composition, and polishing method Kazusei Tamai, Maiko Asai, Yuuichi Ito, Kyosuke Tenko, Toru Kamada 2021-02-16
10882157 Polishing pad and polishing method Kazusei Tamai, Muneaki Tahara, Maiko Asai, Yuuichi Ito 2021-01-05
10835805 Sliding instrument and method for manufacturing same Hiroyuki Ishida, Naoto Miyamoto 2020-11-17
10450651 Article comprising metal oxide-containing coating Kazusei Tamai, Maiko Asai, Hiroaki Mizuno, Kyohei Ota 2019-10-22
10434622 Polishing tool and polishing method for member having curved surface shape Yutaka Niwano, Keigo Ohashi, Kazusei Tamai 2019-10-08
9994748 Polishing composition Hiroshi Asano, Maiko Asai, Kazusei Tamai 2018-06-12
9879156 Polishing composition Jun Ito, Kazutoshi Hotta, Hiroyasu Sugiyama 2018-01-30
9476137 Metal oxide film, laminate, metal member and process for producing the same Tadahiro Ohmi, Yasuyuki Shirai, Yasuhiro Kawase, Masafumi Kitano, Fumikazu Mizutani +1 more 2016-10-25
9157011 Polishing composition Keiji ASHITAKA, Muneaki Tahara 2015-10-13
9149744 Filtration method, method for purifying polishing composition using it, method for regenerating filter to be used for filtration, and filter regenerating apparatus Shinji Furuta, Kazusei Tamai 2015-10-06
9028709 Surface treatment composition and surface treatment method using same Kohsuke Tsuchiya, Noboru Yasufuku, Shuhei Takahashi, Tomohiro Imao 2015-05-12
9028574 Polishing composition Keiji ASHITAKA, Akihito Yasui 2015-05-12
8702472 Polishing composition and polishing method using the same Kazusei Tamai, Hiroshi Asano 2014-04-22
8632693 Wetting agent for semiconductors, and polishing composition and polishing method employing it Shuhei Takahashi, Shogaku Ide, Tomohiro Imao, Naoyuki Ishihara 2014-01-21
8268735 Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface Tadahiro Ohmi 2012-09-18
8226924 Method for producing boehmite particles and method for producing alumina particles Muneaki Tahara, Keiji ASHITAKA 2012-07-24
8206833 Metal oxide film, laminate, metal member and process for producing the same Tadahiro Ohmi, Yasuyuki Shirai, Yasuhiro Kawase, Masafumi Kitano, Fumikazu Mizutani +1 more 2012-06-26
8124240 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure Tadahiro Ohmi, Yasuyuki Shirai, Yasuhiro Kawase, Masafumi Kitano, Fumikazu Mizutani +2 more 2012-02-28
7621281 Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same Makoto Ikemoto, Yasuhiro Kawase 2009-11-24
7541322 Cleaning solution for substrate for semiconductor device and cleaning method Makoto Ikemoto 2009-06-02
7235516 Semiconductor cleaning composition comprising an ethoxylated surfactant Hideaki Mochizuki, Atsushi Itou 2007-06-26
6896744 Method for cleaning a surface of a substrate Hideaki Mochizuki 2005-05-24
6498132 Method for treating surface of substrate and surface treatment composition used for the same Masaya Fujisue 2002-12-24