Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6756453 | Alicylic epoxy compounds and their preparation process, alicylic epoxy resin composition, and encapsulant for light-emitting diode | Kouya Murai, Masayuki Honda | 2004-06-29 |
| 5759736 | Photoresist composition | Koji Nakano, Tadashi Kusumoto, Yasuhiro Kawase | 1998-06-02 |
| 5698362 | 1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist pattern | Koji Nakano, Makoto Ikemoto, Tadashi Kusumoto, Yasuhiro Kawase | 1997-12-16 |
| 5695906 | Photosensitive resin composition and method for forming a pattern using the composition | Koji Nakano, Keisuke Nakano, Iwao Matsuo | 1997-12-09 |
| 5660967 | Photosensitive resin composition and method for forming photoresist pattern using the same | Koji Nakano, Yoshihiro Takada | 1997-08-26 |
| 5635329 | Photosensitive resin composition and method for forming a pattern using the composition | Koji Nakano, Makoto Ikemoto | 1997-06-03 |
| 5611850 | Composition for anti-reflective coating on resist | Tadashi Teramoto | 1997-03-18 |
| 5514526 | Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method | Hideo Makishima | 1996-05-07 |
| 5447825 | Method for forming a pattern using a photosensitive composition comprising an alkali-soluble resin made from a phenolic compound and at least two different aldehydes | Koji Nakano, Yoshihiro Takada | 1995-09-05 |
| 5372909 | Photosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydes | Koji Nakano, Yoshihiro Takada | 1994-12-13 |
| 5279918 | Photoresist composition comprising a quinone diazide sulfonate of a novolac resin | Koji Nakano, Tadashi Kusumoto, Keisuke Nakano, Yoshihiro Takada | 1994-01-18 |
| 4469882 | Process for the production of aromatic carbamates | Tsutomu Takeuchi, Toshio Irie, Hirotaka Ryuto | 1984-09-04 |