Issued Patents All Time
Showing 26–50 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8241708 | Formation of insulator oxide films with acid or base catalyzed hydrolysis of alkoxides in supercritical carbon dioxide | Chien M. Wai, Hiroyuki Ohde | 2012-08-14 |
| 8173034 | Methods of utilizing block copolymer to form patterns | Dan B. Millward, Gurtej S. Sandhu | 2012-05-08 |
| 8043944 | Process for enhancing solubility and reaction rates in supercritical fluids | Theodore M. Taylor | 2011-10-25 |
| 8033884 | Methods of forming plasma-generating structures; methods of plasma-assisted etching, and methods of plasma-assisted deposition | Neal R. Rueger | 2011-10-11 |
| 7862316 | Foamed mechanical planarization pads made with supercritical fluid | — | 2011-01-04 |
| 7649316 | Assemblies for plasma-enhanced treatment of substrates | Neal R. Rueger | 2010-01-19 |
| 7625495 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | Jim Hofmann, Gundu M. Sabde, Scott E. Moore | 2009-12-01 |
| 7598181 | Process for enhancing solubility and reaction rates in supercritical fluids | Theodore M. Taylor | 2009-10-06 |
| 7563157 | Apparatus for conditioning chemical-mechanical polishing pads | — | 2009-07-21 |
| 7393741 | Methods of forming pluralities of capacitors | Gurtej S. Sandhu, H. Montgomery Manning | 2008-07-01 |
| 7267608 | Method and apparatus for conditioning a chemical-mechanical polishing pad | — | 2007-09-11 |
| 7261832 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | Jim Hofmann, Gundu M. Sabde, Scott E. Moore | 2007-08-28 |
| 7223154 | Method for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates | Michael J. Joslyn | 2007-05-29 |
| 7199005 | Methods of forming pluralities of capacitors | Gurtej S. Sandhu, H. Montgomery Manning | 2007-04-03 |
| 7192336 | Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates | Michael J. Joslyn | 2007-03-20 |
| 7166247 | Foamed mechanical planarization pads made with supercritical fluid | — | 2007-01-23 |
| 7063599 | Apparatus, systems, and methods for conditioning chemical-mechanical polishing pads | — | 2006-06-20 |
| 7040965 | Methods for removing doped silicon material from microfeature workpieces | Theodore M. Taylor | 2006-05-09 |
| 7037177 | Method and apparatus for conditioning a chemical-mechanical polishing pad | — | 2006-05-02 |
| 6858538 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | Jim Hofmann, Gundu M. Sabde, Scott E. Moore | 2005-02-22 |
| 6720266 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | Jim Hofmann, Gundu M. Sabde, Scott E. Moore | 2004-04-13 |
| 6709317 | Method and apparatus for uniformly planarizing a microelectronic substrate | Scott Meikle | 2004-03-23 |
| 6699791 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | Jim Hofmann, Gundu M. Sabde, Scott E. Moore | 2004-03-02 |
| 6682628 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | James J. Hoffmann, Gundu M. Sabde, Michael J. Joslyn | 2004-01-27 |
| 6652363 | Method and apparatus for uniformly planarizing a microelectronic substrate | Scott Meikle | 2003-11-25 |