Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7223154 | Method for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates | Stephen J. Kramer | 2007-05-29 |
| 7210989 | Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces | — | 2007-05-01 |
| 7192336 | Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates | Stephen J. Kramer | 2007-03-20 |
| 6837942 | Device and method for collecting and measuring chemical samples pad surface in CMP | — | 2005-01-04 |
| 6722943 | Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces | — | 2004-04-20 |
| 6682628 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | James J. Hoffmann, Gundu M. Sabde, Stephen J. Kramer | 2004-01-27 |
| 6605159 | Device and method for collecting and measuring chemical samples on pad surface in CMP | — | 2003-08-12 |
| 6595832 | Chemical mechanical polishing methods | Sidney B. Rigg | 2003-07-22 |
| 6592443 | Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates | Stephen J. Kramer | 2003-07-15 |
| 6533893 | Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids | Gundu M. Sabde, James J. Hofmann, Whonchee Lee | 2003-03-18 |
| 6475071 | Cross flow slurry filtration apparatus and method | — | 2002-11-05 |
| 6464824 | Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies | James J. Hofmann, Gundu M. Sabde, Stephen J. Kramer | 2002-10-15 |
| 6413834 | Methods for etching silicon dioxide; and methods for forming isolation regions | — | 2002-07-02 |
| 6383934 | Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids | Gundu M. Sabde, James J. Hofmann, Whonchee Lee | 2002-05-07 |
| 6203404 | Chemical mechanical polishing methods | Sidney B. Rigg | 2001-03-20 |