MJ

Michael J. Joslyn

Micron: 15 patents #1,089 of 6,345Top 20%
Overall (All Time): #326,716 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7223154 Method for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates Stephen J. Kramer 2007-05-29
7210989 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces 2007-05-01
7192336 Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates Stephen J. Kramer 2007-03-20
6837942 Device and method for collecting and measuring chemical samples pad surface in CMP 2005-01-04
6722943 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces 2004-04-20
6682628 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies James J. Hoffmann, Gundu M. Sabde, Stephen J. Kramer 2004-01-27
6605159 Device and method for collecting and measuring chemical samples on pad surface in CMP 2003-08-12
6595832 Chemical mechanical polishing methods Sidney B. Rigg 2003-07-22
6592443 Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates Stephen J. Kramer 2003-07-15
6533893 Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids Gundu M. Sabde, James J. Hofmann, Whonchee Lee 2003-03-18
6475071 Cross flow slurry filtration apparatus and method 2002-11-05
6464824 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies James J. Hofmann, Gundu M. Sabde, Stephen J. Kramer 2002-10-15
6413834 Methods for etching silicon dioxide; and methods for forming isolation regions 2002-07-02
6383934 Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids Gundu M. Sabde, James J. Hofmann, Whonchee Lee 2002-05-07
6203404 Chemical mechanical polishing methods Sidney B. Rigg 2001-03-20