Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8674512 | Method to align mask patterns | Gurtej S. Sandhu, William T. Rericha | 2014-03-18 |
| 8338085 | Method to align mask patterns | Gurtej S. Sandhu, William T. Rericha | 2012-12-25 |
| 7767129 | Imprint templates for imprint lithography, and methods of patterning a plurality of substrates | Gurtej S. Sandhu | 2010-08-03 |
| 7655387 | Method to align mask patterns | Gurtej S. Sandhu, William T. Rericha | 2010-02-02 |
| 7455956 | Method to align mask patterns | Gurtej S. Sandhu, William T. Rericha | 2008-11-25 |
| 7435536 | Method to align mask patterns | Gurtej S. Sandhu, William T. Rericha | 2008-10-14 |
| 7375793 | Apparatus for photolithographic processing | Kevin G. Duesman | 2008-05-20 |
| 7271413 | Semiconductor constructions | Gordon A. Haller, Sanh D. Tang, Steven D. Cummings | 2007-09-18 |
| 7122425 | Methods of forming semiconductor constructions | Gordon A. Haller, Sanh D. Tang, Steven D. Cummings | 2006-10-17 |
| 6872509 | Apparatus and methods for photolithographic processing | Kevin G. Duesman | 2005-03-29 |
| 5581104 | Static discharge circuit having low breakdown voltage bipolar clamp | Tyler Lowrey | 1996-12-03 |
| 5328810 | Method for reducing, by a factor or 2.sup.-N, the minimum masking pitch of a photolithographic process | Tyler Lowrey, David A. Cathey | 1994-07-12 |
| 5208125 | Phase shifting reticle fabrication using ion implantation | Tyler Lowrey | 1993-05-04 |
| 5177027 | Process for fabricating, on the edge of a silicon mesa, a MOSFET which has a spacer-shaped gate and a right-angled channel path | Tyler Lowrey, D. Mark Durcan, Pierre C. Fazan, Fernando Gonzalez, Gordon A. Haller | 1993-01-05 |
| 5146308 | Semiconductor package utilizing edge connected semiconductor dice | Eugene H. Cloud | 1992-09-08 |
| 5126286 | Method of manufacturing edge connected semiconductor die | — | 1992-06-30 |
| 5087951 | Semiconductor memory device transistor and cell structure | Tyler Lowrey | 1992-02-11 |
| 5032530 | Split-polysilicon CMOS process incorporating unmasked punchthrough and source/drain implants | Tyler Lowrey, Ward Parkinson | 1991-07-16 |
| 5013680 | Process for fabricating a DRAM array having feature widths that transcend the resolution limit of available photolithography | Tyler Lowrey, D. Mark Durcan, Ruojia Lee, Charles H. Dennison, Yauh-Ching Liu +3 more | 1991-05-07 |
| 4957878 | Reduced mask manufacture of semiconductor memory devices | Tyler Lowrey | 1990-09-18 |