MF

Mark Fischer

Micron: 76 patents #203 of 6,345Top 4%
RR Round Rock Research: 1 patents #177 of 239Top 75%
📍 Meridian, ID: #12 of 654 inventorsTop 2%
🗺 Idaho: #142 of 8,810 inventorsTop 2%
Overall (All Time): #23,216 of 4,157,543Top 1%
79
Patents All Time

Issued Patents All Time

Showing 51–75 of 79 patents

Patent #TitleCo-InventorsDate
6458649 Methods of forming capacitor-over-bit line memory cells John K. Zahurak, Kunal R. Parekh 2002-10-01
6458663 Masked nitrogen enhanced gate oxide John T. Moore 2002-10-01
6440850 Structure for an electrical contact to a thin film in a semiconductor structure and method for making the same Kunal R. Parekh, Charles H. Dennison 2002-08-27
6429151 Semiconductor wafer assemblies comprising silicon nitride, methods of forming silicon nitride, and methods of reducing stress on semiconductive wafers John T. Moore, Scott DeBoer 2002-08-06
6423582 Use of DAR coating to modulate the efficiency of laser fuse blows Zhiping Yin, Thomas R. Glass, Kunal R. Parekh, Gurtej S. Sandhu 2002-07-23
6417559 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials John T. Moore, Scott DeBoer, J. Brett Rolfson, Annette L. Martin, Ardavan Niroomand 2002-07-09
6410951 Structure for improving static refresh Charles H. Dennison, Fawad Ahmed, Richard H. Lane, John K. Zahurak, Kunal R. Parekh 2002-06-25
6406977 Isolation region forming methods David Dickerson, Richard H. Lane, Charles H. Dennison, Kunal R. Parekh, John K. Zahurak 2002-06-18
6376358 Method of forming plugs and local interconnect for embedded memory/system-on-chip (SOC) applications Jigish Trivedi, Charles H. Dennison, Todd R. Abbott, Raymond A. Turi 2002-04-23
6372601 Isolation region forming methods David Dickerson, Richard H. Lane, Charles H. Dennison, Kunal R. Parekh, John K. Zahurak 2002-04-16
6329267 Isolation region forming methods David Dickerson, Richard H. Lane, Charles H. Dennison, Kunal R. Parekh, John K. Zahurak 2001-12-11
6326321 Methods of forming a layer of silicon nitride in semiconductor fabrication processes Scott DeBoer, John T. Moore, Randhir P. S. Thakur 2001-12-04
6323139 Semiconductor processing methods of forming photoresist over silicon nitride materials John T. Moore, Scott DeBoer, J. Brett Rolfson, Annette L. Martin, Ardavan Niroomand 2001-11-27
6316372 Methods of forming a layer of silicon nitride in a semiconductor fabrication process Scott DeBoer, John T. Moore, Randhir P. S. Thakur 2001-11-13
6309973 Semiconductor processing methods of forming a conductive projection and methods of increasing alignment tolerances John K. Zahurak, Thomas M. Graettinger, Kunal R. Parekh 2001-10-30
6300253 Semiconductor processing methods of forming photoresist over silicon nitride materials, and semiconductor wafer assemblies comprising photoresist over silicon nitride materials John T. Moore, Scott DeBoer 2001-10-09
6300671 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials John T. Moore, Scott DeBoer 2001-10-09
6238999 Isolation region forming methods David Dickerson, Richard H. Lane, Charles H. Dennison, Kunal R. Parekh, John K. Zahurak 2001-05-29
6093956 Semiconductor wafer assemblies comprising silicon nitride, methods of forming silicon nitride, and methods of reducing stress on semiconductive wafers John T. Moore, Scott DeBoer 2000-07-25
6083803 Semiconductor processing methods of forming a conductive projection and methods of increasing alignment tolerances John K. Zahurak, Thomas M. Graettinger, Kunal R. Parekh 2000-07-04
6010941 Method of forming a capacitor Mark E. Jost, Kunal R. Parekh 2000-01-04
5985771 Semiconductor wafer assemblies comprising silicon nitride, methods of forming silicon nitride, and methods of reducing stress on semiconductive wafers John T. Moore, Scott DeBoer 1999-11-16
5962885 Method of forming a capacitor and a capacitor construction Mark E. Jost, Kunal R. Parekh 1999-10-05
5960294 Method of fabricating a semiconductor device utilizing polysilicon grains John K. Zahurak, Scott DeBoer, Randhir P. S. Thakur 1999-09-28
5932491 Reduction of contact size utilizing formation of spacer material over resist pattern Phillip G. Wald, William A. Stanton 1999-08-03