Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Laurence D. Schultz — 16 Patents

Micron: 9 patents #1,593 of 6,374Top 25%
ATAT&T: 3 patents #5,559 of 18,772Top 30%
ASAgere Systems: 2 patents #639 of 1,849Top 35%
MTMicroelectronic & Computer Technology: 1 patents #56 of 112Top 50%
TITexas Instruments: 1 patents #7,388 of 12,488Top 60%
Boise, ID: #580 of 3,546 inventorsTop 20%
Idaho: #864 of 8,810 inventorsTop 10%
Overall (All Time): #284,196 of 4,157,543Top 7%
16 Patents All Time
Laurence D. Schultz has been granted 16 US patents while listed as an inventor at Micron. The first was granted in 1991 and the most recent in April 2010. Laurence D. Schultz ranks #284,196 of 4,157,543 US inventors in our database (top 6.8%). Patent records list Laurence D. Schultz in Boise, ID, US.

Patents per Year

Patents granted per year, 1991 to 2010Bar chart with a peak of 3 patents in 1991.peak 31991: 3 patents19911992: 1 patents19921993: 2 patents19931995: 1 patents19951996: 1 patents19961999: 2 patents19992000: 3 patents20002004: 1 patents20042005: 1 patents20052010: 1 patents2010

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
7695589 Versatile system for conditioning slurry in CMP process David Anthony Stark, Neal Murphy 2010-04-13 $14,416,000
6896583 Method and apparatus for conditioning a polishing pad Jose Omar Rodriquez, Charles Storey 2005-05-24
6702654 Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof Arun K. Nanda, Jose Omar Rodriguez, Charles Storey 2004-03-09
6083838 Method of planarizing a surface on a semiconductor wafer Randolph H. Burton, Yaw S. Obeng 2000-07-04
6056630 Polishing apparatus with carrier head pivoting device Arun K. Nanda 2000-05-02 $96,316,000
6048256 Apparatus and method for continuous delivery and conditioning of a polishing slurry Yaw S. Obeng 2000-04-11 $67,246,000
5980363 Under-pad for chemical-mechanical planarization of semiconductor wafers Scott Meikle 1999-11-09 $11,356,000
5871392 Under-pad for chemical-mechanical planarization of semiconductor wafers Scott Meikle 1999-02-16 $18,099,000
5514245 Method for chemical planarization (CMP) of a semiconductor wafer to provide a planar surface free of microscratches Trung T. Doan, Malcolm Grief 1996-05-07 $51,608,000
5421769 Apparatus for planarizing semiconductor wafers, and a polishing pad for a planarization apparatus Mark E. Tuttle, Trung T. Doan 1995-06-06 $52,953,000
RE34425 Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer 1993-11-02
5234867 Method for planarizing semiconductor wafers with a non-circular polishing pad Mark E. Tuttle, Trung T. Doan 1993-08-10 $2,781,000
5081796 Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer 1992-01-21 $2,568,000
5069002 Apparatus for endpoint detection during mechanical planarization of semiconductor wafers Gurtej S. Sandhu, Trung T. Doan 1991-12-03 $2,153,000
5036015 Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers Gurtej S. Sandhu, Trung T. Doan 1991-07-30 $6,773,000
5011580 Method of reworking an electrical multilayer interconnect Ju-Don T. Pan, John Curry 1991-04-30