| 7695589 |
Versatile system for conditioning slurry in CMP process |
David Anthony Stark, Neal Murphy |
2010-04-13 |
| 6896583 |
Method and apparatus for conditioning a polishing pad |
Jose Omar Rodriquez, Charles Storey |
2005-05-24 |
| 6702654 |
Conditioning wheel for conditioning a semiconductor wafer polishing pad and method of manufacture thereof |
Arun K. Nanda, Jose Omar Rodriguez, Charles Storey |
2004-03-09 |
| 6083838 |
Method of planarizing a surface on a semiconductor wafer |
Randolph H. Burton, Yaw S. Obeng |
2000-07-04 |
| 6056630 |
Polishing apparatus with carrier head pivoting device |
Arun K. Nanda |
2000-05-02 |
| 6048256 |
Apparatus and method for continuous delivery and conditioning of a polishing slurry |
Yaw S. Obeng |
2000-04-11 |
| 5980363 |
Under-pad for chemical-mechanical planarization of semiconductor wafers |
Scott Meikle |
1999-11-09 |
| 5871392 |
Under-pad for chemical-mechanical planarization of semiconductor wafers |
Scott Meikle |
1999-02-16 |
| 5514245 |
Method for chemical planarization (CMP) of a semiconductor wafer to provide a planar surface free of microscratches |
Trung T. Doan, Malcolm Grief |
1996-05-07 |
| 5421769 |
Apparatus for planarizing semiconductor wafers, and a polishing pad for a planarization apparatus |
Mark E. Tuttle, Trung T. Doan |
1995-06-06 |
| RE34425 |
Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer |
— |
1993-11-02 |
| 5234867 |
Method for planarizing semiconductor wafers with a non-circular polishing pad |
Mark E. Tuttle, Trung T. Doan |
1993-08-10 |
| 5081796 |
Method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer |
— |
1992-01-21 |
| 5069002 |
Apparatus for endpoint detection during mechanical planarization of semiconductor wafers |
Gurtej S. Sandhu, Trung T. Doan |
1991-12-03 |
| 5036015 |
Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers |
Gurtej S. Sandhu, Trung T. Doan |
1991-07-30 |
| 5011580 |
Method of reworking an electrical multilayer interconnect |
Ju-Don T. Pan, John Curry |
1991-04-30 |
