Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
BC

Brian J. Coppa — 16 Patents

Micron: 7 patents #2,094 of 6,374Top 35%
TLTokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
AMAmbature: 2 patents #5 of 10Top 50%
Tempe, AZ: #167 of 2,648 inventorsTop 7%
Arizona: #2,184 of 32,909 inventorsTop 7%
Overall (All Time): #284,196 of 4,157,543Top 7%
16 Patents All Time
Brian J. Coppa has been granted 16 US patents while listed as an inventor at Micron. The first was granted in 2012 and the most recent in November 2025. Brian J. Coppa ranks #284,196 of 4,157,543 US inventors in our database (top 6.8%). Patent records list Brian J. Coppa in Tempe, AZ, US.

Patents per Year

Patents granted per year, 2012 to 2024Bar chart with a peak of 3 patents in 2019.peak 32012: 1 patents20122014: 1 patents20142016: 1 patents20162017: 1 patents20172018: 1 patents20182019: 3 patents20192020: 2 patents20202022: 3 patents20222024: 2 patents2024

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12463044 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2025-11-04
12063874 Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials Douglas J. Gilbert, Y. Eugene Shteyn, Michael James Smith, Joel Patrick Hanna, Paul Greenland +1 more 2024-08-13
11935756 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2024-03-19
11335563 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2022-05-17 $11,540,000
11289639 Electrical, mechanical, computing, and/or other devices formed of extremely low resistance materials Douglas J. Gilbert, Y. Eugene Shteyn, Michael James Smith, Joel Patrick Hanna, Paul Greenland +1 more 2022-03-29
11273469 Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy Deepak Vedhachalam, Francois C. Dassapa 2022-03-15
10773282 Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy Deepak Vedhachalam, Francois C. Dassapa 2020-09-15
10607844 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2020-03-31 $9,822,000
10446453 Surface modification control for etch metric enhancement Viswas Purohit, Seiichi Watanabe, Kenji Komatsu 2019-10-15
10333047 Electrical, mechanical, computing/ and/or other devices formed of extremely low resistance materials Douglas J. Gilbert, Y. Eugene Shteyn, Michael James Smith, Joel Patrick Hanna, Paul Greenland +1 more 2019-06-25
10304668 Localized process control using a plasma system Vaidya Bharadwaj 2019-05-28
10096483 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2018-10-09 $33,519,000
9761457 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2017-09-12 $16,077,000
9305782 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2016-04-05 $6,062,000
8852851 Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same Baosuo Zhou, Mirzafer Abatchev, Ardavan Niroomand, Paul A. Morgan, Shuang Meng +1 more 2014-10-07 $11,727,000
8129289 Method to deposit conformal low temperature SiO2 John Smythe, Gurtej S. Sandhu, Shyam Surthi, Shuang Meng 2012-03-06 $4,847,000