BV

Brian A. Vaartstra

Micron: 136 patents #88 of 6,345Top 2%
ON onsemi: 15 patents #91 of 1,901Top 5%
AC Advanced Technology & Materials Co.: 7 patents #65 of 410Top 20%
MI Mosaid Technologies Incorporated: 2 patents #86 of 170Top 55%
📍 Nampa, ID: #3 of 306 inventorsTop 1%
🗺 Idaho: #38 of 8,810 inventorsTop 1%
Overall (All Time): #5,268 of 4,157,543Top 1%
162
Patents All Time

Issued Patents All Time

Showing 126–150 of 162 patents

Patent #TitleCo-InventorsDate
6207630 Processing compositions and methods of using same 2001-03-27
6204175 Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer Gilbert Lai, Gurtej S. Sandhu, Ravi Iyer 2001-03-20
6197628 Ruthenium silicide diffusion barrier layers and methods of forming same Eugene P. Marsh 2001-03-06
6159855 Organometallic compound mixtures in chemical vapor deposition 2000-12-12
6149828 Supercritical etching compositions and method of using same 2000-11-21
6136703 Methods for forming phosphorus- and/or boron-containing silica layers on substrates 2000-10-24
6133161 Methods of forming a film on a substrate using complexes having tris(pyrazolyl) methanate ligands Stefan Uhlenbrock 2000-10-17
6133159 Methods for preparing ruthenium oxide films Eugene P. Marsh 2000-10-17
6130160 Methods, complexes and system for forming metal-containing films 2000-10-10
6127192 Complexes having tris (pyrazolyl) borate ligands for forming films Stefan Uhlenbrock 2000-10-03
6114557 Methods for preparing ruthenium and osmium compounds Stefan Uhlenbrock 2000-09-05
6110529 Method of forming metal films on a substrate by chemical vapor deposition Robin A. Gardiner, Peter S. Kirlin, Thomas H. Baum, Douglas Gordon, Timothy E. Glassman +1 more 2000-08-29
6095161 Processing and post-processing compositions and methods of using same 2000-08-01
6087270 Method of patterning substrates Alan R. Reinberg, Kevin G. Donohoe 2000-07-11
6074945 Methods for preparing ruthenium metal films Eugene P. Marsh 2000-06-13
6063705 Precursor chemistries for chemical vapor deposition of ruthenium and ruthenium oxide 2000-05-16
6030491 Processing compositions and methods of using same 2000-02-29
6020511 Methods, complexes, and systems for forming metal-containing films Brenda D. Wanner 2000-02-01
6010969 Method of depositing films on semiconductor devices by using carboxylate complexes 2000-01-04
5962716 Methods for preparing ruthenium and osmium compounds Stefan Uhlenbrock 1999-10-05
5948322 Source reagents for MOCVD formation of non-linear optically active metal borate films and optically active metal borate films formed therefrom Thomas H. Baum, Gregory T. Stauf, Daniel Studebaker 1999-09-07
5924012 Methods, complexes, and system for forming metal-containing films 1999-07-13
5919522 Growth of BaSrTiO.sub.3 using polyamine-based precursors Thomas H. Baum, Gregory T. Stauf, Peter S. Kirlin, Duncan W. Brown, Robin A. Gardiner +1 more 1999-07-06
5916690 Metal carboxylate complexes for formation of metal-containing films on semiconductor devices 1999-06-29
5908947 Difunctional amino precursors for the deposition of films comprising metals 1999-06-01