Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11049956 | Method of forming a semiconductor device | Dean E. Probst, Jeffery A. Neuls, Masaichi Eda, Peter A. Burke, Prasad Venkatraman | 2021-06-29 |
| 9029215 | Method of making an insulated gate semiconductor device having a shield electrode structure | Zia Hossain, Gordon M. Grivna, Duane B. Barber, Balaji Padmanabhan, Prasad Venkatraman | 2015-05-12 |
| 7911034 | Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafers | Shiqun Gu, James R. B. Elmer, Richard J. Carter, Thomas Rueckes | 2011-03-22 |
| 7538040 | Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafers | Shiqun Gu, James R. B. Elmer, Richard J. Carter, Thomas Rueckes | 2009-05-26 |
| 7098515 | Semiconductor chip with borderless contact that avoids well leakage | Shioun Gu, Derryl J. Allman | 2006-08-29 |
| 6972840 | Method of reducing process plasma damage using optical spectroscopy | Shiqun Gu, Ryan Tadashi Fujimoto | 2005-12-06 |
| 6893937 | Method for preventing borderless contact to well leakage | Shiqun Gu, Derryl J. Allman | 2005-05-17 |
| 6794304 | Method and apparatus for reducing microtrenching for borderless vias created in a dual damascene process | Shiqun Gu, Masaichi Eda, Hong Lin, Jim Elmer | 2004-09-21 |
| 6743669 | Method of reducing leakage using Si3N4 or SiON block dielectric films | Hong Lin, Shiqun Gu | 2004-06-01 |
| 6673200 | Method of reducing process plasma damage using optical spectroscopy | Shiqun Gu, Ryan Tadashi Fujimoto | 2004-01-06 |
| 6551901 | Method for preventing borderless contact to well leakage | Shiqun Gu, Derryl J. Allman | 2003-04-22 |